Orientation Zernike polynomials: A useful way to describe the polarization effects of optical imaging systems

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 3, 2009, Pages

  Ruoff, Johannes ^a   Totzeck, Michael ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

Hyper NA; Lithography; Polarization; Projection systems

Indexed keywords

POLARIZATION; PROJECTION SYSTEMS;

BASE FUNCTION; DIATTENUATION; HIGH NUMERICAL APERTURES; HYPER-NA; IN-DEPTH UNDERSTANDING; OPTICAL IMAGING SYSTEM; POLARIZATION EFFECT; VECTOR IMAGING; ZERNIKE POLYNOMIALS;

POLYNOMIALS;

EID: 78049389623     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3173803     Document Type: Conference Paper

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