The impact of projection lens polarization properties on lithographic process at hyper-NA

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Geh, Bernd ^a,b   Ruoff, Johannes ^a   Zimmermann, Jörg ^a   Gräupner, Paul ^a   Totzeck, Michael ^a   Mengel, Markus ^a   Hempelmann, Uwe ^a   Schmitt Weaver, Emil ^b  

^a CARL ZEISS SMT AG   (Germany)

^b ASML US Inc   (United States)

Author keywords

Hyper NA; Jones matrix; Low kl imaging; Optical proximity effect; Pauli matrices; Poincar decomposition; Polar decomposition; Polarization

Indexed keywords

JONES MATRIX; OPTICAL PROXIMITY EFFECT; PAULI MATRICES; POLAR DECOMPOSITION;

IMAGING TECHNIQUES; LENSES; LIGHTING; OPTICAL SYSTEMS; POLARIZATION;

PHOTOLITHOGRAPHY;

EID: 35148834789     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.722317     Document Type: Conference Paper

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