Pushing the boundary: Low-k1 extension by polarized illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Van Setten, Eelco ^a   De Boeij, Wim ^a   Hepp, Birgitt ^a   Le Masson, Nicolas ^a   Swinkels, Geert ^a   Van De Kerkhof, Mark ^a  

^a ASML   (Netherlands)

Author keywords

High NA; Hyper NA; Immersion lithography; Low k1; Polarization

Indexed keywords

COMPUTER SIMULATION; LIGHT POLARIZATION; OPTICAL MATERIALS; PERMITTIVITY;

CRITICAL DIMENSION; IMMERSION LITHOGRAPHY; VOLUME PRODUCTION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 35048850413     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713873     Document Type: Conference Paper

References (10)

1. D.G.Flagello et al, "Polarization effects associated with hyper-numerical-aperture (>1) lithography", J. Microlith., Microfab., Microsyst., 4(3), 031104 (Jul-Sep 2005)
2. B. Geh et al, "The impact of projection lens polarization properties on lithographic process at hyper-NA", Optical Microlithography XX, to be published in Proceedings of SPIE (2007)
3. C. Kohler et.al., "Imaging enhancements by Polarization Illumination: Theory and Practice", Optical Microlithography XVIII, Proceedings of SPIE, Vol 5754 (2005)
4. W. de Boeij et al, "Enabling the 45nm node by hyper-NA polarized lithography", Optical Microlithography XIX, Proceedings of SPIE, Vol 6154 (2006)
5. J. van Schoot et al, "The mask error factor: causes and implications for process latitude", Optical Microlithography XII, Proceedings of SPIE, Vol. 3679 (1999)
6. L.H. A. Leunissen et al, "Full spectral analysis of Line Width Roughness", Metrology, Inspection and Process Control for Microlithography XIX, Proceedings of SPIE, Vol. 5752 (2005)
7. http://www.itrs.net/links/2006Update/FinalToPost/ 14_Metrology2006Update.pdf
8. B. Geh et al, " The impact of mask birefringence on Hyper-NA (NA>1.0) Polarized Imaging", BACUS Symposium on Photomask Technology, Proceedings of SPIE, Vol 5992 (2005)
9. M. van de Kerkhof et al, "Mask substrate birefringence requirements for hyper-NA lithography", Optical Microlithography XIX, Proceedings of SPIE, Vol 6154 (2006)
10. J. de Klerk et al, "Performance of a 1.35NA ArF immersion lithography system for 40nm applications", Optical Microlithography XX, to be published in Proceedings of SPIE (2007)