Orientation Zernike Polynomials - A systematic description of polarized imaging using high NA lithography lenses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7140, Issue , 2008, Pages

  Heil, Tilmann ^a   Ruoff, Johannes ^a   Neumann, Jens Timo ^a   Totzeck, Michael ^a   Krähmer, Daniel ^a   Geh, Bernd ^a,b   Gräupner, Paul ^a  

^a CARL ZEISS SMT AG   (Germany)

^b ASML US Inc   (United States)

Author keywords

Extreme high NA; Immersion lithography; Low kl imaging; Polarization

Indexed keywords

BASE FUNCTIONS; DIATTENUATION; EXTREME HIGH NA; IMMERSION LITHOGRAPHY; IN-DEPTH UNDERSTANDING; LOW KL IMAGING; VECTOR IMAGING; ZERNIKE POLYNOMIALS;

LENSES; OPTICAL INSTRUMENTS; PHOTOLITHOGRAPHY; POLARIZATION;

POLYNOMIAL APPROXIMATION;

EID: 62449169461     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.805438     Document Type: Conference Paper

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