SCOPUS 정보 검색 플랫폼

Volumn 5754, Issue PART 1, 2005, Pages 92-106

Polarized light for resolution enhancement at 70nm and beyond

Author keywords

CD control; Depth of focus; DRAM; Exposure latitude; MEF; Polarization; Process window

Indexed keywords

COMPACT DISKS; COMPUTER SIMULATION; DYNAMIC RANDOM ACCESS STORAGE; ERROR ANALYSIS; LIGHTING; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; SILICON WAFERS;

CD CONTROL; DEPTH-OF-FOCUS; EXPOSURE LATITUDE; MEF; PROCESS WINDOW; RESOLUTION ENHANCEMENT;

LIGHT POLARIZATION;

EID: 23044452461 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.619863 Document Type: Conference Paper

Times cited : (12)

References (11)

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2
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4
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6
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- Polarization effects in immersion lithography
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7
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- Benefiting from polarization effects on high-NA imaging
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8
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9
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10
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- Development of a polarized-light illuminator and its impact
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11
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- Study of high-NA imaging with polarized illumination
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- Matsuyama, T.¹ Nakashima, T.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.