Wafer-scale fabrication of penetrating neural microelectrode arrays

Biomedical Microdevices

Volumn 12, Issue 5, 2010, Pages 797-807

  Bhandari, Rajmohan ^a   Negi, Sandeep ^a   Solzbacher, Florian ^a  

^a University of Utah   (United States)

Author keywords

High aspect ratio; MEMS; Microelectrodes; Neural interface; Utah electrode array (UEA); Wafer scale fabrication

Indexed keywords

BATCH FABRICATION; CLINICAL RESEARCH; DEVICE PERFORMANCE; ELECTRICAL CHARACTERISTIC; ELECTRODE ARRAYS; ELECTRODE GEOMETRIES; FABRICATION COST; HIGH ASPECT RATIO; LOWER COST; MICROELECTRODE ARRAY; NEURAL INTERFACES; NOVEL ARCHITECTURE; TEMPORAL RESOLUTION; UTAH ELECTRODE ARRAYS; WAFER SCALE FABRICATION; WAFER-SCALE;

ASPECT RATIO; MICROELECTRODES; SURFACE DEFECTS;

FABRICATION;

ARTICLE; BRAIN NERVE CELL; CONTROLLED STUDY; COST; GEOMETRY; MICROELECTRODE; MICROTECHNOLOGY; PRIORITY JOURNAL; PROCESS TECHNOLOGY; QUALITY CONTROL; REPRODUCIBILITY; UTAH ELECTRODE ARRAY;

ELECTRIC IMPEDANCE; ELECTRIC STIMULATION; ELECTRODES; MICROARRAY ANALYSIS; MICROTECHNOLOGY; NERVOUS SYSTEM;

EID: 78049280174     PISSN: 13872176     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10544-010-9434-1     Document Type: Article

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