Microelectrode array fabrication by electrical discharge machining and chemical etching

IEEE Transactions on Biomedical Engineering

Volumn 51, Issue 6, 2004, Pages 890-895

  Fofonoff, Timothy A ^a   Martel, Sylvain M ^a,d,e,f   Hatsopoulos, Nicholas G ^b,f,g   Donoghue, John P ^c   Hunter, Ian W ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b UNIVERSITY OF CHICAGO   (United States)

^c BROWN UNIVERSITY   (United States)

^d UNIVERSITÉ DE MONTRÉAL   (Canada)

^e EPM

^f EPM ^*

^g UNIVERSITY OF CHICAGO   (United States)

Author keywords

Brain machine interface; Electrical discharge machining (EDM); Intracortical recording; Microelectrode array; Neural implant

Indexed keywords

BRAIN ACTIVITY; CHEMICAL ETCHING; INTRACORTICALLY;

BRAIN MODELS; ELECTRIC DISCHARGE MACHINING; ETCHING; FABRICATION; RECORDING;

MICROELECTRODES;

ARTICLE; BRAIN; BRAIN MACHINE INTERFACE; CHEMICAL ETCHING; ELECTRICAL DISCHARGE MACHINING; ELECTROCHEMISTRY; IMPLANT; INTRACORTICAL RECORDING; MICROELECTRODE; MICROELECTRODE ARRAY; MOUSE; NEURAL IMPLANT; NONHUMAN; RECORDING;

ACTION POTENTIALS; ANIMALS; CEREBRAL CORTEX; ELECTROCHEMISTRY; ELECTRODES, IMPLANTED; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; MANUFACTURED MATERIALS; MICE; MICROELECTRODES; NANOTECHNOLOGY; NERVE NET; NEURONS;

EID: 2442711559     PISSN: 00189294     EISSN: None     Source Type: Journal    
DOI: 10.1109/TBME.2004.826679     Document Type: Article

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