Wafer-scale processed, low impedance, neural arrays with varying length microelectrodes

TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems

Volumn , Issue , 2009, Pages 1210-1213

  Bhandari, R ^a,b   Negi, S ^a,b   Rieth, L ^a   Solzbacher, F ^a,b  

^a UNIVERSITY OF UTAH   (United States)

^b Blackrock Microsystems   (United States)

Author keywords

Aspect ratio photo resist; Impedance; Neural electrode array; Peripheral nerve

Indexed keywords

ELECTRICAL CHARACTERISTIC; ELECTRODE ARRAYS; ELECTRODE GEOMETRIES; HIGH PRECISION; LOW IMPEDANCE; NERVE FIBERS; NEURAL ELECTRODE ARRAYS; NEURAL INTERFACES; NEURAL PROSTHESIS; PERIPHERAL NERVE; PERIPHERAL NERVES; SILICON MICROMACHINING; WAFER SCALE FABRICATION; WAFER-SCALE;

ABERRATIONS; ACTUATORS; ASPECT RATIO; MICROELECTRODES; MICROSYSTEMS; NEURAL NETWORKS; PHOTORESISTORS; PIEZOELECTRIC TRANSDUCERS; PRESSURE DROP; SILICON WAFERS;

SOLID-STATE SENSORS;

EID: 71449084060     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2009.5285875     Document Type: Conference Paper

References (8)

1. K. L. Drake, K. D. Wise, J. Farraye, D. J. Anderson, and S. L. BeMent, "Performance of planar multisite microprobes in recording extracellular single-unit intracortical activity," Biomedical Engineering, IEEE Transactions on,vol. 35, p. 719, 1988.
2. D. A. Robinson, "The electrical properties of metal microelectrodes," Proceedingsof the IEEE, vol. 56, pp. 1065-1071, 1968.
3. P. K. Campbell, K. E. Jones, R. J. Huber, K. W. Horch, R. A. Normann, "A Silicon-Based, Three Dimensional Neural Interface: Manufacturing Processes for an Intra cortical Electrode Array", IEEE Transaction on Biomedical Engineering, Vol. 38, No. 38, August 1991, 758-768.
4. Branner, A., R. B. Stein, R.A. Normann. (2001) "Selective stimulation of cat sciatic nerve using an array of varying-length microelectrodes." J Neurophysiol 85(4): 1585-94.
5. Branner A, Stein RB, Fernandez E, Aoyagi Y, Normann RA, Long-term stimulation and recording with a penetrating microelectrode array in cat sciatic nerve. IEEE Trans Biomed Eng. 2004 Jan;51(1):146-57.
6. R. Bhandari, S. Negi, L. Rieth, F. Solzbacher, "A Wafer Scale Etching Technique for High Aspect Ratio Implantable MEMS Structures, "submitted to IEEE Journal of Microelectromechanical Systems.
7. S. Negi, R. Bhandari, L Rieth, and F. Solzbacher, "Effect of pressure on pulsed-DC sputtered Iridium Oxide Films", Sensor and Actuator-B, doi.org/10.1016/j.snb.2008.11.015
8. R. Bhandari, S. Negi, L. Rieth, R.A Normann, F. Solzbacher, "A Novel Masking Technique for High Aspect Ratio Penetrating Microelectrode Arrays" submitted to J. Microengineering and Micromechanics.