A novel masking method for high aspect ratio penetrating microelectrode arrays

Journal of Micromechanics and Microengineering

Volumn 19, Issue 3, 2009, Pages

  Bhandari, R ^a   Negi, S ^a   Rieth, L ^a   Normann, R A ^a   Solzbacher, F ^a,b  

^a Department of Electrical and Computer Engineering   (United States)

^b UNIVERSITY OF UTAH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM FOIL; ASPECT RATIO; MECHANICAL PROPERTIES; MICROELECTRODES; OXYGEN; PHOTORESISTORS; PHOTORESISTS; SIGNAL PROCESSING; SURFACE DEFECTS; SURFACE TREATMENT;

ACTIVE ELECTRODES; ELECTRICAL AND MECHANICAL PROPERTIES; ELECTRODE ARRAYS; ELECTRODE IMPEDANCES; ELECTRODE TIPS; FABRICATION TECHNOLOGIES; HIGH ASPECT RATIOS; MICRO ELECTRODE ARRAYS; NERVOUS SYSTEMS; NEURAL INTERFACES; NON UNIFORMITIES; OXYGEN PLASMAS; PARYLENE; PARYLENE-C; PHOTORESIST COATINGS; PRECISE CONTROLS; PROCESS PARAMETERS; PROCESSING ELECTRONICS; SPIN-SPEED; WAFER-SCALE;

PROCESS CONTROL;

EID: 61849162299     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/3/035004     Document Type: Article

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