Structural and discharging properties of MgO thin films prepared by pulsed laser deposition

Thin Solid Films

Volumn 519, Issue 2, 2010, Pages 846-851

  Kodu, M ^a   Raud, J ^a   Aints, M ^a   Avarmaa, T ^a   Denks, V ^a   Choi, J S ^b   Feldbach, E ^a   Jaaniso, R ^a   Kirm, M ^a   Lee, M S ^b   Maaroos, A ^a   Matulevich, Y T ^b   Mandar H ^a   Sammelselg, V ^a  

^a UNIVERSITY OF TARTU   (Estonia)

^b Samsung SDI   (South Korea)

Author keywords

Electronic devices; Laser ablation; Magnesium; Oxides; Plasma display panels; Surface roughness

Indexed keywords

CRYSTALLINITIES; DEPOSITION TEMPERATURES; DISCHARGE CELLS; ELECTRONIC DEVICE; FILM DEPOSITION; FILM STRUCTURE; FIRING VOLTAGE; MGO FILMS; MGO THIN FILMS; OXYGEN PRESSURE; PLASMA DISPLAY PANEL; PLASMA DISPLAY PANELS; PULSED LASER; SUBSTRATE TEMPERATURE; X RAY REFLECTION;

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRIC DISCHARGES; LASER ABLATION; LASER APPLICATIONS; MAGNESIUM; OXYGEN; PULSED LASER DEPOSITION; PULSED LASERS; SURFACE PROPERTIES; SURFACE ROUGHNESS; THERMOELECTRIC EQUIPMENT; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

PLASMA DISPLAY DEVICES;

EID: 77958508452     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.08.136     Document Type: Article

References (35)

1. J.P. Boeuf J. Phys. D Appl. Phys. 36 2003 R53
2. T. Urade, T. Iemori, M. Osawa, N. Nakayama, and I. Morita IEEE Trans. Electron Devices ED-23 1976 7
3. Z.N. Yu, J.W. Seo, S.J. Yu, D.X. Zheng, and J. Sun Surf. Coat. Technol. 162 2002 11
4. Y. Morimoto, Y. Tanaka, and A. Ide-Ektessabi Nucl. Instrum. Methods Phys. Res. Sect. B 249 2006 440
5. Z.N. Yu, J.W. Seo, D.X. Zheng, and J. Sun Surf. Coat. Technol. 163-164 2003 398
6. Y.H. Cheng, H. Kupfer, and F. Richter J. Appl. Phys. 94 2003 3627
7. N. Yasui, H. Nomura, and A. Ide-Ektessabi Thin Solid Films 447-448 2004 377
8. R. Kim, Y. Kim, and J.W. Park Vacuum 61 2001 37
9. H.K. Lee, W.J. Kim, S.J. Park, and S.Y. Choi Thin Solid Films 515 2007 5113
10. J. Cho, R. Kim, K.W. Lee, G.Y. Yeom, J.Y. Kim, and J.W. Park Thin Solid Films 350 1999 173
11. B. Guo, C. Liu, Z. Song, L. Liu, Y. Fan, and X. Xia J. Appl. Phys. 98 2005 043304
12. C.H. Park, Y.K. Kim, S.H. Lee, W.G. Lee, and Y.M. Sung Thin Solid Films 366 2000 88
13. T. Chen, X.M. Li, S. Zhang, and H.R. Zeng J. Cryst. Growth 270 2004 553
14. T.J. Zhu, L. Lu, and X.B. Zhao Mater. Sci. Eng., B 129 2006 96
15. R. Hühne, C. Beyer, B. Holzapfel, C.G. Oertel, L. Schultz, and W. Skrotzki Cryst. Res. Technol. 35 2000 419
16. T. Susaki, S. Kumada, T. Katase, K. Matsuzaki, M. Miyakawa, and H. Hosono Appl. Phys. Express 2 2009 091403
17. R. Eason Pulsed Laser Deposition of Thin Films 2007 John Wiley & Sons, Inc. Hoboken, New Jersey
18. A. Maaroos Trudy Inst. Fiz. Estonskoi SSR 53 1982 49
19. M. Kodu, T. Avarmaa, H. Mändar, and R. Jaaniso Appl. Phys. A: Mater. Sci. Process. 93 2008 801
20. H. Mändar, J. Felsche, V. Mikli, and T. Vajakas J. Appl. Crystallogr. 32 1999 345
21. L.G. Parratt Phys. Rev. 95 1954 359
22. V. Denks, M. Aints, T. Avarmaa, J.S. Choi, E. Feldbach, R. Jaaniso, A. Kasikov, M. Kirm, M. Kodu, M.S. Lee, A. Maaroos, Y.T. Matulevich, H. Mändar, and J. Raud J. Phys. D Appl. Phys. 40 2007 4503
23. P.K. Bachmann, V. van Elsbergen, D.U. Wiechert, G. Zhong, and J. Robertson Diamond Relat. Mater. 10 2001 809
24. Z. Falkenstein, and J.J. Coogan J. Phys. D Appl. Phys. 30 1997 817
25. Z. Yu, W. Xue, D. Zheng, and J. Sun Plasma Sci. Technol 9 2007 284
26. Y. Tanaka, S.H. Hsiao, Y. Morimoto, A. Nakano, and A. Ide-Ektessabi Nucl. Instrum. And Methods In Phys. Res. B 261 2007 209
27. S.Y. Park, M.J. Lee, H.J. Kim, S.H. Moon, S.G. Kim, and J.K. Kim J. Vac. Sci. Technol., A 23 2005 1162
28. M.J. Lee, S.Y. Park, S.G. Kim, H.J. Kim, S.H. Moon, and J.K. Kim J. Vac. Sci. Technol., A 23 2005 1192
29. D.K. Fork, F.A. Ponce, J.C. Tramontana, and T.H. Geballe Appl. Phys. Lett. 58 1991 2294
30. Y.H. Cheng, H. Kupfer, U. Krause, T. Kopte, C. Peters, and F. Richter Surf. Coat. Technol. 177-178 2004 784
31. E. Feldbach, R. Jaaniso, M. Kodu, V.P. Denks, A. Kasikov, P. Liblik, A. Maaroos, H. Mändar, and M. Kirm J. Mater. Sci. Mater. Electron. 20 2009 321
32. T. Nakano, T. Fujimoto, and S. Baba Vacuum 74 2004 595
33. P.V. Sushko, J.L. Gavartin, and A.L. Shluger J. Phys. Chem. B 106 2002 2269
34. E.H. Choi, J.Y. Lim, Y.G. Kim, J.J. Ko, D.I. Kim, C.W. Lee, and G.S. Cho J. Appl. Phys. 86 1999 6525
35. Y. Motoyama, and F. Sato IEEE Transact. Plasma Sci. 34 2006 336