Fabrication of flat mgo(111) films on al2o3(0001) substrates by pulsed laser deposition

Applied Physics Express

Volumn 2, Issue 9, 2009, Pages

  Susaki, Tomofumi ^a,b   Kumada, Sho ^a   Katase, Takayoshi ^a   Matsuzaki, Kosuke ^a   Miyakawa, Masashi ^a   Hosono, Hideo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION CONDITIONS; ELECTROSTATIC POTENTIALS; OXIDE STRUCTURES; OXYGEN PARTIAL PRESSURE; PLD TECHNIQUE; ROOT MEAN SQUARE ROUGHNESS; SUBSTRATE TEMPERATURE; TERRACE STRUCTURE;

DEPOSITION; EPITAXIAL FILMS; OXIDE FILMS; OXYGEN; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER DEPOSITION; SOIL CONSERVATION;

SUBSTRATES;

EID: 70349148138     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.2.091403     Document Type: Article

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