Towards fast femtosecond laser micromachining of fused silica: The effect of deposited energy.

Optics Express

Volumn 18, Issue 20, 2010, Pages 21490-21497

  Rajesh, Sheeba ^a   Bellouard, Yves ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE MICROMECHANICS; ETCHING; FUSED SILICA; GLASS; GLASS LASERS; MICROMACHINING; PHOTONICS; PULSED LASER APPLICATIONS; SILICA;

ABLATION THRESHOLDS; DEPOSITED ENERGY; DRIVING FACTORS; ETCHING RATE; FEMTOSECOND LASER MICROMACHINING; GLASS MATERIALS; LASER EXPOSURE; LOW ENERGIES; MICROMACHINING PROCESS; OPTIMAL ENERGY;

ULTRASHORT PULSES;

EID: 77958007403     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.021490     Document Type: Article

References (25)

1. K. M. Davis, K. Miura, N. Sugimoto, and K. Hirao, "Writing waveguides in glass with a femtosecond laser," Opt. Lett. 21(21), 1729-1731 (1996).
2. Y. Sikorski, A. Said, P. Bado, R. Maynard, C. Florea, and K. Winick, "Optical waveguide amplifier in Nd-doped glass written with near-IR femtosecond laser pulses," Electron. Lett. 36(3), 226-227 (2000). (Pubitemid 30563639)
3. K. Minoshima, A. M. Kowalevicz, I. Hartl, E. P. Ippen, and J. G. Fujimoto, "Photonic device fabrication in glass by use of nonlinear materials processing with a femtosecond laser oscillator," Opt. Lett. 26(19), 1516-1518 (2001).
4. S. Nolte, M. Will, J. Burghoff, and A. Tuennermann, "Femtosecond waveguide writing: a new avenue to three-dimensional integrated optics," Appl. Phys., A Mater. Sci. Process. 77(1), 109-111 (2003).
5. R. Osellame, S. Taccheo, M. Marangoni, R. Ramponi, P. Laporta, D. Polli, S. De Silvestri, and G. Cerullo, "Femtosecond writing of active optical waveguides with astigmatically shaped beams," J. Opt. Soc. Am. B 20(7), 1559-1567 (2003).
6. R. W. A. Applegate, Jr., J. Squier, T. Vestad, J. Oakey, D. W. M. Marr, P. Bado, M. A. Dugan, and A. A. Said, "Microfluidic sorting system based on optical waveguide integration and diode laser bar trapping," Lab Chip 6(3), 422-426 (2006).
7. Y. Hanada, K. Sugioka, H. Kawano, I. S. Ishikawa, A. Miyawaki, and K. Midorikawa, "Nano-aquarium for dynamic observation of living cells fabricated by femtosecond laser direct writing of photostructurable glass," Biomed. Microdevices 10(3), 403-410 (2008).
8. Y. Bellouard, A. Said, and P. Bado, "Integrating optics and micro-mechanics in a single substrate: a step toward monolithic integration in fused silica," Opt. Express 13(17), 6635-6644 (2005), http://www. opticsinfobase.org/oe/abstract.cfm?URI=oe-13-17-6635.
9. Y. Bellouard, A. Said, M. Dugan, and P. Bado, "Monolithic integration in fused silica: When fluidics, mechanics and optics meet in a single substrate," in International Symposium on Optomechatronic Technologies (2009), pp. 445-450.
10. A. Marcinkevi Ius, S. Juodkazis, M. Watanabe, M. Miwa, S. Matsuo, H. Misawa, and J. Nishii, "Femtosecond laser-assisted three-dimensional microfabrication in silica," Opt. Lett. 26(5), 277-279 (2001).
11. Y. Bellouard, A. Said, M. Dugan, and P. Bado, "Fabrication of high-aspect ratio, micro-fluidic channels and tunnels using femtosecond laser pulses and chemical etching," Opt. Express 12(10), 2120-2129 (2004), http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-12-10-2120.
12. S. Kiyama, S. Matsuo, S. Hashimoto, and Y. Morihira, "Examination of Etching Agent and Etching Mechanism on Femotosecond Laser Microfabrication of Channels Inside Vitreous Silica Substrates," J. Phys. Chem. C 113(27), 11560-11566 (2009).
13. C. Hnatovsky, R. S. Taylor, E. Simova, V. R. Bhardwaj, D. M. Rayner, and P. B. Corkum, "Polarization-selective etching in femtosecond laser-assisted microfluidic channel fabrication in fused silica," Opt. Lett. 30(14), 1867-1869 (2005). (Pubitemid 41083756)
14. C. Schaffer, J. García, and E. Mazur, "Bulk heating of transparent materials using a high-repetition-rate femtosecond laser," Appl. Phys., A Mater. Sci. Process. 76(3), 351-354 (2003).
15. S. Eaton, H. Zhang, P. Herman, F. Yoshino, L. Shah, J. Bovatsek, and A. Arai, "Heat accumulation effects in femtosecond laser-written waveguides with variable repetition rate," Opt. Express 13(12), 4708-4716 (2005), http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-13-12-4708.
16. W. Yang, P. G. Kazansky, Y. Shimotsuma, M. Sakakura, K. Miura, and K. Hirao, "Ultrashort-pulse laser calligraphy," Appl. Phys. Lett. 93(17), 171109 (2008).
17. W. Yang, P. G. Kazansky, and Y. P. Svirko, "Non-reciprocal ultrafast laser writing," Nat. Photonics 2(2), 99-104 (2008).
18. B. Poumellec, M. Lancry, J.-C. Poulin, and S. Ani-Joseph, "Non reciprocal writing and chirality in femtosecond laser irradiated silica," Opt. Express 16(22), 18354-18361 (2008), http://www.opticsinfobase.org/abstract. cfm?URI=oe-16-22-18354.
19. J. W. Chan, T. Huser, S. Risbud, and D. M. Krol, "Structural changes in fused silica after exposure to focused femtosecond laser pulses," Opt. Lett. 26(21), 1726-1728 (2001). (Pubitemid 33693983)
20. Y. Bellouard, E. Barthel, A. A. Said, M. Dugan, and P. Bado, "Scanning thermal microscopy and Raman analysis of bulk fused silica exposed to low-energy femtosecond laser pulses," Opt. Express 16(24), 19520-19534 (2008), http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-24- 19520.
21. Y. Bellouard, T. Colomb, C. Depeursinge, M. Dugan, A. A. Said, and P. Bado, "Nanoindentation and birefringence measurements on fused silica specimen exposed to low-energy femtosecond pulses," Opt. Express 14(18), 8360-8366 (2006), http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-14-18- 8360. (Pubitemid 44331054)
22. M. Tomozawa, Y. Lee, and Y. Peng, "Effect of uniaxial stresses on silica glass structure investigated by IR spectroscopy," J. Non-Cryst. Solids 242(2-3), 104-109 (1998).
23. A. Agarwal, and M. Tomozawa, "Correlation of silica glass properties with the infrared spectra," J. Non-Cryst. Solids 209(1-2), 166-174 (1997).
24. Y. Shimotsuma, P. G. Kazansky, J. Qiu, and K. Hirao, "Self-organized nanogratings in glass irradiated by ultrashort light pulses," Phys. Rev. Lett. 91(24), 247405 (2003).
25. 2 materials: A family member of active centers in radio, photo, and chemical responses," J. Appl. Phys. 94(10), 6243-6262 (2003).