Development of atmospheric pressure CVD processes for highquality transparent conductive oxides

Energy Procedia

Volumn 2, Issue 1, 2010, Pages 41-48

  De Graaf, Aril ^a   Van Deelen, Joop ^a   Poodt, Paul ^a   Van Mol, Ton ^b   Spee, Karel ^b   Grob, Frank ^a   Kuypers, Ando ^a  

^a TNO   (Netherlands)

^b HOLST CENTRE   (Netherlands)

Author keywords

Atmospheric pressure chemical vapor deposition; Gas phase chemistry; Plasma enhanced chemical vapor deposition; Process optimization; Surface chemistry; Surface morphology; Tin oxide; Transparent conductive oxides; Zinc oxide

Indexed keywords

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; ATMOSPHERIC PRESSURE CVD; GAS PHASE CHEMISTRY; GASPHASE; HIGH QUALITY; HIGH TRANSMITTANCE; INTRINSIC SURFACES; LIGHT TRAPPING EFFECTS; LOW RESISTIVITY; PLASMA-ENHANCED CVD; PROCESS CONDITION; PROCESS OPTIMIZATION; PRODUCT REQUIREMENTS; REACTOR DESIGNS; RESEARCH AND DEVELOPMENT; TRANSPARENT CONDUCTIVE OXIDES;

ATMOSPHERIC PRESSURE; ATMOSPHERICS; CAPILLARITY; DEPOSITION; GASES; MORPHOLOGY; OPTIMIZATION; PHOTOVOLTAIC EFFECTS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROCESS CONTROL; STRUCTURAL DESIGN; SURFACE CHEMISTRY; SURFACE MORPHOLOGY; SURFACES; TIN; TIN OXIDES; TITANIUM COMPOUNDS; VAPOR DEPOSITION; ZINC; ZINC OXIDE;

ATMOSPHERIC CHEMISTRY;

EID: 77957812941     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2010.07.008     Document Type: Conference Paper

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