Optical and structural properties of SnO2 films grown by a low-cost CVD technique

Materials Letters

Volumn 54, Issue 2-3, 2002, Pages 158-163

  Rajaram, P ^a   Goswami, Y C ^a   Rajagopalan, S ^b   Gupta, V K ^a  

^a JIWAJI UNIVERSITY   (India)

^b INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

CVD; Thin films; Tin oxide; Transparent conductors

Indexed keywords

CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; DIFFRACTION; ELECTRON BEAMS; FILM GROWTH; SECONDARY ION MASS SPECTROMETRY; SILICA; SOL-GELS; TIN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

PHOTOCHEMICAL VAPOR DEPOSITION;

THIN FILMS;

EID: 0036570491     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(01)00555-9     Document Type: Article

References (18)