Computational fluid dynamic modeling of tin oxide deposition in an impinging chemical vapor deposition reactor

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1400-1410

  Li, Mingheng ^a   Sopko, John F ^a   McCamy, James W ^a  

^a Glass Technology Center   (United States)

Author keywords

Chemical vapor deposition; Computer simulation; Diffusion; Tin oxide

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPUTATIONAL GEOMETRY; COMPUTER SIMULATION; DIFFUSION; FLOW OF FLUIDS; MATHEMATICAL MODELS; TIN COMPOUNDS;

FLOW GEOMETRY; GAS PHASES; IMPINGING CHEMICAL VAPOR DEPOSITION REACTORS; TIN OXIDE;

COMPUTATIONAL FLUID DYNAMICS;

EID: 33751225380     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.03.052     Document Type: Article

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