Fabrication of 3D nanoimprint stamps with continuous reliefs using dose-modulated electron beam lithography and thermal reflow

Journal of Micromechanics and Microengineering

Volumn 20, Issue 9, 2010, Pages

  Schleunitz, Arne ^a   Schift, Helmut ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS PROFILE; LATERAL RESOLUTION; NANOIMPRINT STAMPS; POST PROCESSING; SHARP CORNERS; SHARP FEATURES; SILICON SUBSTRATES; SMOOTH SURFACE; THERMAL REFLOW; THICK RESIST;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FABRICATION; PLASMA ETCHING; THREE DIMENSIONAL;

NANOIMPRINT LITHOGRAPHY;

EID: 77957804985     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/20/9/095002     Document Type: Article

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