Molecular interaction radii and rate constants for clarifying organic compound physisorption on silicon surface

Journal of the Electrochemical Society

Volumn 157, Issue 11, 2010, Pages

  Habuka, Hitoshi ^a   Naito, Tatsuhito ^a   Kawahara, Norihiro ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DESORPTION RATE CONSTANTS; IN-SITU MEASUREMENT; ISOPROPYL ALCOHOLS; MULTI-COMPONENT SYSTEMS; ORGANIC CONTAMINATION; SILICON SURFACES; STEADY STATE; SURFACE CONCENTRATION; THREE-COMPONENT SYSTEM;

ACTIVE NETWORKS; DESORPTION; EQUATIONS OF STATE; MOLECULAR INTERACTIONS; MOLECULAR STRUCTURE; ORGANIC COMPOUNDS; PHYSISORPTION; QUARTZ; SILICON COMPOUNDS;

RATE CONSTANTS;

EID: 77957720326     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3489364     Document Type: Article

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