Analysis of organic contamination adsorbed on a silicon surface in a vacuum chamber in electron beam lithography

Journal of the Electrochemical Society

Volumn 152, Issue 6, 2005, Pages

  Saga, Koichiro ^a   Hattori, Takeshi ^a  

^a SONY CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEGASSING; ELECTRON BEAM LITHOGRAPHY; ELECTRON ENERGY LOSS SPECTROSCOPY; GAS CHROMATOGRAPHY; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

AIRBORNE ORGANIC VOLATILES; ELECTRON BEAM IRRADIATION; ORGANIC CONTAMINATION; STENCIL MEMBRANE MASKS;

SILICON WAFERS;

EID: 22544447806     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1914756     Document Type: Article

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