Electrical characterization of etch rate for micro- and nano-scale gap formation

Journal of Microelectromechanical Systems

Volumn 19, Issue 5, 2010, Pages 1260-1263

  Lee, Donovan ^a   Tran, Helen ^a   Ho, Byron ^a   Liu, Tsu Jae King ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Etch characterization; gap formation; microelectromechanical systems (MEMS); nano electro mechanical (NEM); release

Indexed keywords

ELECTRO-MECHANICAL; ETCH CHARACTERIZATION; GAP FORMATION; MICROELECTROMECHANICAL SYSTEMS (MEMS); RELEASE;

MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; OPTICAL CORRELATION; OPTICAL MICROSCOPY;

COMPOSITE MICROMECHANICS;

EID: 77957552890     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2010.2067432     Document Type: Article

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