Scaling limitations for flexural beams used in electromechanical devices

IEEE Transactions on Electron Devices

Volumn 56, Issue 4, 2009, Pages 688-691

  Lee, Donovan ^a   Osabe, Taro ^a,b   Liu, Tsu Jae King ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b HITACHI LTD   (Japan)

Author keywords

Microelectromechanical systems; Nanoelectromechanical systems; Relays; Scaling

Indexed keywords

BEAM LENGTHS; EULER-BERNOULLI; HIGH STRAINS; IN PROCESS; MICROELECTROMECHANICAL SYSTEMS; NANO-METER REGIMES; NANOELECTROMECHANICAL SYSTEMS; RELAYS; SCALING; SCALING LIMITATIONS; STRUCTURAL MATERIALS;

BUILDING MATERIALS; COMPOSITE MICROMECHANICS; ELECTRODYNAMICS; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES;

NEMS;

EID: 65449134740     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2009.2014190     Document Type: Article

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