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Thin Solid Films

Volumn 518, Issue 21 SUPPL., 2010, Pages

Influence of carbon dioxide gas on internal stress and film density of tin oxide films grown by magnetron sputtering

(4) Ashida, Toru a Kato, Kazuhiro a Omoto, Hideo a Takamatsu, Atsushi a

a CENTRAL GLASS CO LTD (Japan)

Author keywords

CO2 gas; Dc sputtering; Film density; Interatomic repulsive force; Internal stress; SnO2

Indexed keywords

CO2 GAS; DC SPUTTERING; FILM DENSITY; INTERNAL STRESS; REPULSIVE FORCES; SNO2;

AERODYNAMICS; AMORPHOUS FILMS; CARBON DIOXIDE; CARBON FILMS; DEPOSITION RATES; FLOW OF GASES; GASES; TIN; TIN DIOXIDE; TIN OXIDES; TITANIUM COMPOUNDS;

OXIDE FILMS;

EID: 77957020295 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.03.022 Document Type: Conference Paper

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.