Characterization of reactive DC magnetron sputtered TiAlN thin films

Crystal Research and Technology

Volumn 43, Issue 10, 2008, Pages 1078-1082

  Subramanian, B ^a   Ashok, K ^a   Kuppusami, P ^b   Sanjeeviraja, C ^c   Jayachandran, M ^a  

^a CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

^b INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

^c ALAGAPPA UNIVERSITY   (India)

Author keywords

Reactive sputtering; Thin films; XRD

Indexed keywords

ALUMINA; ALUMINUM COMPOUNDS; LIGHT EMISSION; LUMINESCENCE; MAGNETRONS; MICROSCOPES; NITRIDES; REACTIVE SPUTTERING; SCANNING ELECTRON MICROSCOPY; SOLIDS; THICK FILMS; THIN FILMS; TITANIUM; TITANIUM NITRIDE; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS;

ATOMIC FORCE MICROSCOPES; CHARACTERISTIC PEAKS; CUBIC STRUCTURES; DC MAGNETRONS; DIRECT CURRENT MAGNETRON SPUTTERING; LASER RAMAN; MILD STEEL SUBSTRATES; OPTICAL QUALITIES; PREFERRED ORIENTATIONS; SCANNING ELECTRON MICROSCOPES; TITANIUM ALUMINUM NITRIDES; X-RAY DIFFRACTIONS; XRD;

MAGNETRON SPUTTERING;

EID: 55349098505     PISSN: 02321300     EISSN: 15214079     Source Type: Journal    
DOI: 10.1002/crat.200811175     Document Type: Article

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