Low energy electron point source microscopy: Beyond imaging

Journal of Physics Condensed Matter

Volumn 22, Issue 34, 2010, Pages

  Beyer, André ^a   Gölzhäuser, Armin ^a  

^a BIELEFELD UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LEVELS; CONDUCTIVITY IMAGING; ELECTRICAL FIELD; ELECTRICAL RESISTANCES; ELECTROSTATIC CHARGING; HIGH SENSITIVITY; HIGHER RESOLUTION; IN-LINE; LOW ENERGY ELECTRONS; POINT SOURCES; RADIATION INDUCED PROCESS; RESOLUTION LIMITS; STRUCTURAL DETERMINATION; STRUCTURAL FEATURE;

ELECTRIC FIELDS; HOLOGRAMS; NANOWIRES;

BALLOONS;

CHEMICAL MODEL; DIAGNOSTIC IMAGING; ELECTROMAGNETIC FIELD; ELECTRON; EQUIPMENT DESIGN; HOLOGRAPHY; INSTRUMENTATION; METHODOLOGY; MICROSCOPY; NORMAL DISTRIBUTION; PHYSICS; REVIEW; STATISTICAL MODEL;

DIAGNOSTIC IMAGING; ELECTROMAGNETIC FIELDS; ELECTRONS; EQUIPMENT DESIGN; HOLOGRAPHY; MICROSCOPY; MODELS, CHEMICAL; MODELS, STATISTICAL; NORMAL DISTRIBUTION; PHYSICS;

EID: 77957013437     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/22/34/343001     Document Type: Review

References (67)

1. Spence J, Qian W and Zhang X 1994 Ultramicwscopy 55 19
2. Spence JCH 1997 Micron 28 101
3. Isaacson M, Johnson D and Crewe A V 1973 Radial Res. 55 205
4. Kreuzer H J, Nakamura K, Wierzbicki A, Fink H W and Schmid H 1992 Ultramicwscopy 45 381
5. Gölzhäuser A, Volke! B, Grunze M and Kreuzer H J 2002 Micron 33 241
6. Morton G A and Ramberg E G 1939 Phys. Rev. 56 705
7. Boersch H 1939 Z. Techn. Phys. 12 346
8. Melmed A J 1968 Appl. Phys. Lett. 12 100
9. Melmed A J and Smit J 1979 J. Phys. E: Sci. Instrum. 12 355
10. Stocker W, Fink H W and Morin R 1989 Ultramicwscopy 31 379
11. Fink H W 1986 IBM J. Res. Dev. 30 460
12. Fink H W 1988 Phys. Scr. 38 260
13. Fink H W, Stocker W and Schmid H 1990 Phys. Rev. Lett. 65 1204
14. Fink H W, Schmid H, Kreuzer H J and Wierzbicki A 1991 Phys. Rev. Lett. 67 1543
15. Schmid H, Fink H W and Kreuzer J 1995 J. Vac. Sci. Technol. B 13 2428
16. Spence J C H, Qian W and Melmed A J 1993 Ultramicwscopy 52 473
17. Spence J C H, Qian W and Silverman M P 1994 J. Vac. Sci. Technol. A 12 542
18. Spence J C H, Zhang X and Qian W 1995 Electron Holography ed A Tonomura et al (Amsterdam: Elsevier Science) p 267
19. Gölzhäuser A, Völkel B, Jäger B, Zharnikov M, Kreuzer H J and Grunze M 1998 J. Vac. Sci. Technol. A 16 3025
20. Gölzhäuser A 1999 Appl. Surf. Sci. 141 264
21. Park J Y, Kim S H, Suh Y D, Park W G and Kuk Y 1999 Rev. Sci. Instrum. 70 4304
22. Binh V T and Semet V 1998 Ultramicroscopy 73 107
23. Binh V T, Vincent P, Feschet F and Bonard J M 2000 J. Appl. Phys. 88 3385
24. Silverman M P 1995 Cwrr. Sci. 68 1003
25. Silverman M P, Strange W and Spence JCH 1995 Am. J. Phys. 63 800
26. Völkl E, Allard L F and Joy D C 1999 Introduction to Electron Holography (New York: Kluwer Academic/Plenum)
27. Kuk Y and Silverman P J 1986 Appl. Phys. Lett. 48 1597
28. Müller H U, Völkel B, Hofmann M, Wöll C and Grunze M 1993 Ultramicroscopy 50 57
29. Kreuzer H J 1995 Micron 26 503
30. Fink H W, Schmid H, Ermantraut E and Schulz T 1997 J. Opt. Soc. Am. A 14 2168
31. Ciliberto E, Doris K A, Pietro W J, Reisner G M, Ellis D E, Fragala I, Herbstein F H, Ratner M. A and Marks T J 1984 J. Am. Chem. Soc. 106 7748
32. Binh V T, Semet V and Garcia N 1994 Appl. Phys. Lett. 65 2493
33. Prigent M and Morin P 2000 J. Micwsc.-Oxf. 199 197
34. Fink H W and Schönenberger C 1999 Nature 398 407
35. Eisele A, Völkel B, Grunze M and Gölzhäuser A 2008 Z. Phys. Chem. 222 779
36. Weierstall U, Spence J C H, Stevens M and Downing K H 1999 Micron 30 335
37. Bardon J, Degiovanni A, Georges V and Morin R 2002 Ultramicrosc. 92 133
38. Shedd G M 1994 J. Vac. Sci. Technol. A 12 2595
39. Spence J C H 1996 J. Electron Microscopy 45 19
40. Holenstein R, Rothwell T A and Shegelski MRA 2003 Ultramicwscopy 94 99
41. Stevens G B 2009 J. Micwsc.-Oxf. 235 9
42. Prigent M and Morin P 2001 J. Phys. D: Appl. Phys. 34 1167
43. Georges V, Bardon J, Degiovanni A and Morin R 2001 Ultramicwscopy 90 33
44. Chen Q, Wang S and Peng L M 2006 Nanotechnology 17 1087
45. Bussolotti F, D'Ortenzi L, Grossi V, Lozzi L, Santucci S and Passacantando M 2007 Phys. Rev. B 76 125415
46. Weber D H, Beyer A, Völkel B, Gölzhäuser A, Schienker E, Bakin A and Waag A 2007 Appl. Phys. Lett. 91 253126
47. Dorozhkin P, Nejoh H and Fujita D 2002 J. Vac. Sci. Technol. B 20 1044
48. Golberg D, Dorozhkin P, Bando Y, Hasegawa M and Dong Z C 2002 Chem. Phys. Lett. 359 220
49. Dorozhkin P S, Trifonov A S and Dong Z C 2002 Japan. J. Appl. Phys. 2 41 L1376
50. Bognitzki M, Becker M, Graeser M, Massa W, Wendorff J H, Schaper A, Weber D, Beyer A, Gölzhäuser A and Greiner A 2006 Adv. Mater. 18 2384
51. Kuo H S, Hwang I S, Fu T Y, Wu J Y, Chang C C and Tsong T T 2004 Nano Lett. 4 2379
52. Smit G D J, Rogge S and Klapwijk T M 2002 Appl. Phys. Lett. 80 2568
53. Smit G D J, Rogge S and Klapwijk T M 2002 Appl. Phys. Lett. 81 3852
54. Chang P C, Fan Z, Chien C J, Stichtenoth D, Ronning C and Lu J G 2006 Appl. Phys. Lett. 89 133113
55. Lao C S, Li Y, Wong C P and Wang Z L 2007 Nano Lett. 7 1323
56. Shalish I, Temkin H and Narayanamurti V 2004 Phys. Rev. B 69 245401
57. Voss T and Wischmeier L 2008 J. Nanosci. Nanotechnol. 8 228
58. Liao X and Zhang X 2007 J. Phys. Chem. C 111 9081
59. Lai W, Degiovanni A and Morin R 1999 Appl. Phys. Lett. 74 618
60. Dorozhkin P S and Dong Z C 2004 Appl. Phys. Lett. 85 4490
61. Weber D H, Beyer A, Völkel B and Gölzhäuser A 2010 Small 6 1264
62. Möllenstedt G and Düker H 1956 Z. Phys. 145 377
63. Kanaya K, Ono S and Ishigaki F 1978 J. Phys. D: Appl. Phys. 112425
64. Croitoru N, Scidman A and Yassin K 1988 Phys. Ser. 37 555
65. Henrich V E 1973 Rev. Sci. Instrum. 44 456
66. Völkel B, Gölzhäuser A, Müller H U, David C and Grunze M 1997 J. Vac. Sci. Technol. B 15 2877
67. Degiovanni A, Bardon J, Georges V and Morin R 2004 Appl. Phys. Lett. 85 2938