Influence of secondary electrons in proximal probe lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2877-2881

  Volkel B ^a   Golzhauser A ^a   Muller H U ^a   David, C ^a,b   Grunze, M ^a  

^a UNIVERSITY OF HEIDELBERG   (Germany)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000218426     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589748     Document Type: Article

References (15)

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