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Volumn 97, Issue 11, 2010, Pages

Experimental and simulation study of breakdown voltage enhancement of AlGaN/GaN heterostructures by Si substrate removal

Author keywords

[No Author keywords available]

Indexed keywords

ALGAN/GAN; ALGAN/GAN HETEROSTRUCTURES; AVALANCHE BREAKDOWN; BREAKDOWN MECHANISM; BREAKDOWN VOLTAGE; ELECTRICAL MEASUREMENT; ELECTRON DENSITIES; FAILURE MECHANISM; GAN-BASED HETEROSTRUCTURES; GATE DRAIN; HIGH-VOLTAGES; SI SUBSTRATES; SILICON SUBSTRATES; SIMULATION STUDIES; SUBSTRATE STRUCTURE; TCAD SIMULATION;

EID: 77956826303     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3488024     Document Type: Article
Times cited : (68)

References (15)
  • 5
    • 17944370096 scopus 로고    scopus 로고
    • Enhancement of breakdown voltage by AlN buffer layer thickness in AlGaNGaN high-electron-mobility transistors on 4 in. diameter silicon
    • DOI 10.1063/1.1879091, 123503
    • S. Arulkumaran, T. Egawa, S. Matsui, and H. Ishikawa, Appl. Phys. Lett. APPLAB 0003-6951 86, 123503 (2005). 10.1063/1.1879091 (Pubitemid 40596950)
    • (2005) Applied Physics Letters , vol.86 , Issue.12 , pp. 1-3
    • Arulkumaran, S.1    Egawa, T.2    Matsui, S.3    Ishikawa, H.4
  • 14
    • 0033314799 scopus 로고    scopus 로고
    • Experimental evaluation of impact ionization coefficients in GaN
    • DOI 10.1109/55.806100
    • K. Kunihiro, K. Kasahara, Y. Takahashi, and Y. Ohno, IEEE Electron Device Lett. EDLEDZ 0741-3106 20, 608 (1999). 10.1109/55.806100 (Pubitemid 30531495)
    • (1999) IEEE Electron Device Letters , vol.20 , Issue.12 , pp. 608-610
    • Kunihiro, K.1    Kasahara, K.2    Takahashi, Y.3    Ohno, Y.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.