Patterning poly(3-Hexylthiophene) in the sub-50-nm region by nanoimprint lithography

IEEE Transactions on Nanotechnology

Volumn 10, Issue 3, 2011, Pages 482-488

  Scarpa, Giuseppe ^a   Abdellah, Alaa ^a   Exner, Armin ^a   Harrer, Stefan ^a   Blanco, Guillermo Penso ^a   Wiedemann, Wolfgang ^b   Schmidt Mende, Lukas ^b   Lugli, Paolo ^a  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^b UNIVERSITY OF MUNICH   (Germany)

Author keywords

5 diyl) (P3HT); Nanoimprint lithography (NIL); nanostructuring; organic photovoltaic devices (OPVs); organic semiconductors; poly(3 hexylthiophene 2

Indexed keywords

5-DIYL) (P3HT); NANO-STRUCTURING; NANOIMPRINT LITHOGRAPHY (NIL); ORGANIC PHOTOVOLTAIC DEVICES; ORGANIC SEMICONDUCTOR; POLY(3-HEXYLTHIOPHENE-2;

CARRIER MOBILITY; ELECTRIC PROPERTIES; PHOTOVOLTAIC EFFECTS; POLYMERS;

NANOIMPRINT LITHOGRAPHY;

EID: 77956639747     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2010.2048433     Document Type: Article

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