Microstructure and electrical properties of Ti-Si-C-Ag nanocomposite thin films

Surface and Coatings Technology

Volumn 201, Issue 14, 2007, Pages 6465-6469

  Eklund, P ^a   Joelsson, T ^b   Ljungcrantz, H ^b   Wilhelmsson, O ^c   Czigany Zs ^a   Hogberg H ^a   Hultman, L ^a  

^a IFM   (Sweden)

^b Impact Coatings AB   (Sweden)

^c UPPSALA UNIVERSITY   (Sweden)

Author keywords

Electron microscopy; Resistivity; Silver; Sputtering; Titanium carbide; X ray diffraction

Indexed keywords

COALESCENCE; CRYSTAL MICROSTRUCTURE; CRYSTALLITES; ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; NANOCOMPOSITES; STRUCTURAL PROPERTIES; THIN FILMS; TITANIUM CARBIDE;

FOUR-POINT-PROBE SETUP; NANOCOMPOSITE COATINGS; NANOCOMPOSITE THIN FILMS;

COMPOSITE COATINGS;

COALESCENCE; COMPOSITE COATINGS; CRYSTAL MICROSTRUCTURE; CRYSTALLITES; ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; NANOCOMPOSITES; STRUCTURAL PROPERTIES; THIN FILMS; TITANIUM CARBIDE;

EID: 33847155133     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.12.016     Document Type: Article

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