Femtosecond laser induced surface nanostructuring and simultaneous crystallization of amorphous thin silicon film

Optics Express

Volumn 18, Issue 18, 2010, Pages 19379-19385

  Wang, X C ^a   Zheng, H Y ^a   Tan, C W ^a   Wang, F ^b   Yu, H Y ^b   Pey, K L ^b  

^a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTALLIZATION; GLASS LASERS; IRRADIATION; METALLIC FILMS; PULSED LASER APPLICATIONS; PULSED LASERS; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION;

ABSORPTANCE; AFM IMAGE; AMORPHOUS SILICON THIN FILMS; BAND GAPS; COLOR CHANGES; FEMTO-SECOND LASER; FS LASER; GLASS SUBSTRATES; HIGH EFFICIENCY; LASER PROCESSING; MICRO-RAMAN; NANO-STRUCTURING; NANOCRYSTALLINE SI; ONE STEP; POTENTIAL APPLICATIONS; SAMPLE SURFACE; SPECTRUM RANGE; SPIKE PATTERNS; SURFACE NANOSTRUCTURING; THIN FILM SOLAR CELLS; THIN SILICON FILMS; ULTRAFAST PULSED LASERS;

AMORPHOUS SILICON;

EID: 77956358301     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.019379     Document Type: Article

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