Effect of chemical etching on the properties of indium oxide and zinc oxide mixed transparent conductive film

Guangdianzi Jiguang/Journal of Optoelectronics Laser

Volumn 21, Issue 8, 2010, Pages 1210-1213

  Lv, Pei Wei ^a   Hu, Hai Long ^b   Pei, Yu ^a   Lin, Li Mei ^a   Lai, Fa Chun ^a  

^a FUJIAN NORMAL UNIVERSITY   (China)

^b SOUTHWEST UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Chemical etching; In2O3 and ZnO mixed(IZO) films; Optical and electrical properties; Surface morphology

Indexed keywords

CHEMICAL ETCHING; DIRECT CURRENT MAGNETRON SPUTTERING; EFFECT OF CHEMICALS; ELECTRICAL PROPERTY; FOUR-PROBE METHODS; GLASS SUBSTRATES; HOLE DEPTH; HOLE STRUCTURES; INDIUM OXIDE; OPTICAL AND ELECTRICAL PROPERTIES; TRANSPARENT CONDUCTIVE FILMS; ZNO;

ATOMIC FORCE MICROSCOPY; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; HYDROCHLORIC ACID; INDIUM; MORPHOLOGY; OPTICAL FILMS; OPTOELECTRONIC DEVICES; OXIDE FILMS; SUBSTRATES; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; WET ETCHING; ZINC; ZINC OXIDE;

CONDUCTIVE FILMS;

EID: 77956329022     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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