Temperature dependence of the microstructure and resistivity of indium zinc oxide films deposited by direct current magnetron reactive sputtering

Thin Solid Films

Volumn 516, Issue 8, 2008, Pages 2045-2049

  Kim, Do Geun ^a   Lee, Sunghun ^a,b   Kim, Dong Ho ^a   Lee, Gun Hwan ^a   Isshiki, Minoru ^b  

^a Korea Institute of Machine and Materials   (South Korea)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Electrical property; Indium zinc oxide; Magnetron sputtering; Structural property

Indexed keywords

INDIUM COMPOUNDS; MAGNETRON SPUTTERING; STRUCTURAL PROPERTIES; SURFACE ROUGHNESS; THIN FILMS;

DEPOSITION TEMPERATURE; INDIUM ZINC OXIDE; ROOT MEAN SQUARE ROUGHNESS;

MICROSTRUCTURE;

EID: 38649141512     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.181     Document Type: Article

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