Effect of vacuum magnetic annealing on the structural and physical properties of the Ni and Al co-doped ZnO films

Thin Solid Films

Volumn 518, Issue 23, 2010, Pages 7174-7182

  Yu, Mingpeng ^a   Qiu, Hong ^a   Chen, Xiaobai ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b BEIJING TECHNOLOGY AND BUSINESS UNIVERSITY   (China)

Author keywords

Carrier transport; Ferromagnetism; Magnetic annealing; Magnetization behavior; Ni and Al co doped Zinc oxide; Sputtering; Structural properties; Thin films

Indexed keywords

ANISOTROPIC MAGNETIZATION; ANNEALED FILMS; BAND CONDUCTION; CO-DOPED; CO-DOPED ZNO; COLUMNAR GRAIN; COSPUTTERING; DIFFRACTION PEAKS; FILM PLANES; FREE ELECTRON CONCENTRATION; GLASS SUBSTRATES; GRAIN SIZE; GROWING DIRECTION; HIGH TEMPERATURE RANGE; IN-VACUUM; LOW TEMPERATURES; MAGNETIC ANNEALING; MAGNETIZATION BEHAVIOR; NI CONTENT; ORIENTATION GROWTH; ROOM TEMPERATURE; ROOM TEMPERATURE FERROMAGNETISM; STRUCTURAL AND PHYSICAL PROPERTIES; TEMPERATURE DEPENDENCE; THERMALLY ACTIVATED; TRANSPORT MECHANISM; VARIABLE RANGE HOPPING; WURTZITE STRUCTURE; ZNO;

ALUMINUM; ANNEALING; CARRIER TRANSPORT; FERROMAGNETISM; FILM GROWTH; GALVANOMAGNETIC EFFECTS; HALL MOBILITY; MAGNETIC FIELDS; MAGNETIZATION; METAL ANALYSIS; SUBSTRATES; TEMPERATURE DISTRIBUTION; THIN FILMS; VACUUM; ZINC; ZINC OXIDE; ZINC SULFIDE;

OXIDE FILMS;

EID: 77956229129     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.07.045     Document Type: Article

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