Characteristics of Ni-doped ZnO:Al films grown on glass by direct current magnetron co-sputtering

Thin Solid Films

Volumn 515, Issue 7-8, 2007, Pages 3905-3909

  Li, Tengfei ^a   Qiu, Hong ^a   Wu, Ping ^a   Wang, Mingwen ^a   Ma, Ruixin ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

Magnetization; Ni doped ZnO:Al film; Resistivity; Structure; Transmittance

Indexed keywords

CRYSTALLOGRAPHY; DOPING (ADDITIVES); FILM GROWTH; MAGNETIZATION; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; ZINC OXIDE;

ATOMIC RATIO; DIRECT CURRENT MAGNETRON CO-SPUTTERING; GLASS SUBSTRATES; NI DOPED ZNO AL FILMS;

THIN FILMS;

EID: 33846930148     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.019     Document Type: Article

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