Temperature dependence of the magnetization of nanostructured Ni films

Vacuum

Volumn 82, Issue 11, 2008, Pages 1318-1320

  Qiu, Hong ^a   Yu, Mingpeng ^a   Shi, Ji ^b   Nakamura, Yoshio ^b   Nagayama, Sakyo ^c   Hashimoto, Mituru ^d  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c Rikendenshi Co Ltd   (Japan)

^d UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

Author keywords

Curie temperature; Magnetization temperature characteristic; Ni film; Thin columnar grain

Indexed keywords

CURIE TEMPERATURE; METALLIC FILMS; NICKEL; SATURATION MAGNETIZATION; SPUTTER DEPOSITION; THERMAL EFFECTS;

MAGNETIZATION MEASUREMENT; THIN COLUMNAR GRAIN;

NANOSTRUCTURED MATERIALS;

EID: 45049083453     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.03.068     Document Type: Article

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