Characteristics of NixFe100-x films deposited on SiO2/Si(1 0 0) by DC magnetron co-sputtering

Vacuum

Volumn 75, Issue 3, 2004, Pages 217-223

  Chen, Xiaobai ^a,b   Qiu, Hong ^a,c   Qian, Hao ^a   Wu, Ping ^a,c   Wang, Fengping ^a,c   Pan, Liqing ^a,c   Tian, Yue ^a,c  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b BEIJING TECHNOLOGY AND BUSINESS UNIVERSITY   (China)

^c Beijing Keda T MMTD Co Ltd   (China)

Author keywords

Co sputtering; Composition; Magnetization; NixFe100 x film; Resistivity; Structure

Indexed keywords

CHARACTERIZATION; COMPOSITION; ELECTRIC CONDUCTIVITY; FILM GROWTH; MAGNETIZATION; MAGNETRON SPUTTERING; NICKEL ALLOYS; SILICA; SPUTTER DEPOSITION;

CO-SPUTTERING; ROOM TEMPERATURE;

THIN FILMS;

EID: 2942662078     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.03.001     Document Type: Article

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