Temperature dependence of resistance and thermopower of thin indium tin oxide films

Thin Solid Films

Volumn 518, Issue 23, 2010, Pages 6997-7001

  Lin, Bo Tsung ^a   Chen, Yi Fu ^a   Lin, Juhn Jong ^a   Wu, Chih Yuan ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b FU JEN CATHOLIC UNIVERSITY   (Taiwan)

Author keywords

Electron electron interaction; Electronic conduction; Indium tin oxide; Weak localization effect

Indexed keywords

ELECTRONIC CONDUCTION; HELIUM TEMPERATURES; INDIUM TIN OXIDE; INDIUM TIN OXIDE FILMS; INDIUM TIN OXIDE THIN FILMS; ITO FILMS; ITO THIN FILMS; LINEAR TEMPERATURE DEPENDENCE; METALLIC CONDUCTIVITY; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE; THERMAL-ANNEALING; THERMOPOWERS; WEAK LOCALIZATION;

CARRIER CONCENTRATION; ELECTRON-ELECTRON INTERACTIONS; ELECTRONS; HELIUM; INDIUM; INDIUM COMPOUNDS; ITO GLASS; PHOTOLITHOGRAPHY; TEMPERATURE DISTRIBUTION; THERMOELECTRIC POWER; THIN FILMS; TIN; TIN OXIDES; TITANIUM COMPOUNDS; VAPOR DEPOSITION;

OXIDE FILMS;

EID: 77956228180     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.06.010     Document Type: Article

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