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Volumn 63, Issue 27, 2009, Pages 2365-2368

Effects of hydrogen in working gas for sputter-deposition on surface morphology and microstructure of indium tin oxide thin films grown at room temperature

(5) Luo, Suning a,b Kohiki, Shigemi a Okada, Koichi a Mitome, Masanori c Shoji, Fumiya d

a KYUSHU INSTITUTE OF TECHNOLOGY (Japan)

b LIAONING UNIVERSITY OF TECHNOLOGY (China)

c NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

d KYUSHU KYORITSU UNIVERSITY (Japan)

Author keywords

Hydrogen; Indium tin oxide; Microstructure; Surface morphology

Indexed keywords

COLUMNAR GRAIN; FILM SURFACES; GRAIN SIZE; HYDROGEN CONCENTRATION; INDIUM TIN OXIDE; INDIUM TIN OXIDE THIN FILMS; NUCLEATION AND GROWTH; ROOM TEMPERATURE; WORKING GAS;

CARRIER MOBILITY; DEPOSITION; FILM GROWTH; HYDROGEN; INDIUM; METAL DRAWING; MICROSTRUCTURE; MORPHOLOGY; OXIDE FILMS; PHOTOLITHOGRAPHY; THICK FILMS; THIN FILMS; TIN;

SURFACE MORPHOLOGY;

EID: 69849115705 PISSN: 0167577X EISSN: None Source Type: Journal
DOI: 10.1016/j.matlet.2009.08.010 Document Type: Article

Times cited : (2)

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