Thickness limit of BaTiO3 thin film capacitors grown on SUS substrates using aerosol deposition method

Thin Solid Films

Volumn 518, Issue 22, 2010, Pages 6531-6536

  Oh, Jong Min ^a   Nam, Song Min ^a  

^a Kwangwoon University   (South Korea)

Author keywords

Aerosol deposition method; BaTiO3; Leakage current mechanism; Thin film

Indexed keywords

AEROSOL DEPOSITION METHOD; BATIO3; CURRENT MECHANISMS; DIELECTRIC THICKNESS; DOMINANT MECHANISM; FIELD CONCENTRATIONS; FOWLER-NORDHEIM TUNNELING; HARD SUBSTRATE; HIGH ELECTRIC FIELDS; INTERFACE EFFECT; INTERFACE ROUGHNESS; KEY FACTORS; LEAKAGE CURRENT MECHANISM; POOLE-FRENKEL EMISSION; SCHOTTKY EMISSIONS; THICKNESS DEPENDENCE; THICKNESS OF FILMS; THIN-FILM CAPACITORS;

ATMOSPHERIC AEROSOLS; BARIUM COMPOUNDS; DEPOSITION; DIELECTRIC PROPERTIES; ELECTRIC FIELDS; OXYGEN; OXYGEN VACANCIES; RESPIRATORY MECHANICS; STAINLESS STEEL; SUBSTRATES; THIN FILM CIRCUITS; THIN FILMS; VAPOR DEPOSITION;

LEAKAGE CURRENTS;

EID: 77956059368     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.03.159     Document Type: Conference Paper

References (18)

1. S. Shahparnia, and O.M. Ramahi IEEE Trans. Electromagn. Compat. 46 2004 580
2. M. Lahti, K. Kautio, E. Juntunen, J. Petäjä, and P. Karioja 2nd EMRS DTC Technical Conference 2 2005 A25
3. Y. Imanaka, N. Hayashi, M. Takenouchi, and J. Akedo J. Eur. Ceram. Soc. 27 2007 2789
4. J. Akedo J. Therm. Spray Technol. 17 2008 181
5. J. Akedo, and M. Lebedev Jpn. J. Appl. Phys. 38 1999 5397
6. J. Akedo J. Am. Ceram. Soc. 89 2006 1834
7. H. Hatono, T. Ito, and A. Matsumura Jpn. J. Appl. Phys. 46 2007 6915
8. J.M. Oh, N.H. Kim, S.C. Choi, and S.M. Nam Mater. Sci. Eng. B 161 2009 80
9. J.M. Oh, and S.M. Nam J. Cram. Process. Res. 10 2009 674
10. J.M. Oh, and S.M. Nam Jpn. J. Appl. Phys. 48 2009 09KA07-1
11. J. Li, X. Dong, and Y. Chen J. Phys. D : Appl. Phys. 38 2006 3371
12. S.M. Sze Physics of Semiconductor Devices 2nd ed 1981 Wiley New York 252
13. M. Wohlecke, V. Marrello, and A. Onton J. Appl. Phys. 48 1977 1748
14. J. Xu, J. Zhai, X. Yao, J. Xue, and Z. Huang J. Sol-Gel. Sci. Technol. 42 2007 209
15. K.Y. Yiang, Q. Guo, and W.J. Yoo Thin Solid Films 462-463 2004 330
16. P. Riess, G. Ghibaudo, G. Pananakakis, J. Brini, and G. Ghidini J. Non-Cryst. Solids 245 1999 48
17. M.S. Jeon, and D.K. Choi J. Vac. Sci. Technol. B 15 1997 928
18. Y.L. Chiou, J.P. Gambino, and M. Mohammad Solid State Electron. 45 2001 1787