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Volumn 462-463, Issue SPEC. ISS., 2004, Pages 330-333

Study of leakage mechanisms of the copper/Black Diamond™ damascene process

Author keywords

Conduction mechanisms; Interconnects; Low k

Indexed keywords

CONDUCTION MECHANISMS; DAMASCENE STRUCTURES; ELECTROCHEMICAL PLATING;

EID: 4344560406     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.05.051     Document Type: Article
Times cited : (15)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.