메뉴 건너뛰기




Volumn 108, Issue 3, 2010, Pages

Experiments and global model of inductively coupled rf Ar/N2 discharges

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DENSITIES; ELECTRON ENERGY DISTRIBUTIONS; ELECTRON ENERGY PROBABILITY FUNCTIONS; ELECTROPOSITIVE PLASMAS; EXPONENTIALS; GLOBAL MODELS; HIGH ENERGY REGIONS; INDUCTIVELY-COUPLED; MODEL RESULTS; NITROGEN ATOM; PLASMA CHEMISTRIES; ROTATIONAL TEMPERATURE; TOTAL PRESSURE; TWO-TEMPERATURE; VIBRATIONAL TEMPERATURE;

EID: 77955909222     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3468603     Document Type: Article
Times cited : (58)

References (28)
  • 2
    • 18644383746 scopus 로고    scopus 로고
    • 2 in an inductively coupled plasma by vacuum ultraviolet emission spectroscopy
    • DOI 10.1063/1.1501741
    • T. Nakano, S. Kumagai, and S. Samukawa, J. Appl. Phys. JAPIAU 0021-8979 92, 2990 (2002). 10.1063/1.1501741 (Pubitemid 35209223)
    • (2002) Journal of Applied Physics , vol.92 , Issue.6 , pp. 2990
    • Nakano, T.1    Kumagai, S.2    Samukawa, S.3
  • 4
    • 29144468977 scopus 로고    scopus 로고
    • Nitrogen dissociation in a low pressure cylindrical ICP discharge studied by actinometry and mass spectrometry
    • DOI 10.1088/0022-3727/38/24/003, PII S0022372705069688
    • T. Czerwiec, F. Greer, and D. B. Graves, J. Phys. D JPAPBE 0022-3727 38, 4278 (2005). 10.1088/0022-3727/38/24/003 (Pubitemid 41793963)
    • (2005) Journal of Physics D: Applied Physics , vol.38 , Issue.24 , pp. 4278-4289
    • Czerwiec, T.1    Greer, F.2    Graves, D.B.3
  • 5
    • 0036536193 scopus 로고    scopus 로고
    • Ionized physical vapor deposition of titanium nitride: A global plasma model
    • DOI 10.1063/1.1455139
    • K. Tao, D. Mao, and J. Hopwood, J. Appl. Phys. JAPIAU 0021-8979 91, 4040 (2002). 10.1063/1.1455139 (Pubitemid 34435533)
    • (2002) Journal of Applied Physics , vol.91 , Issue.7 , pp. 4040
    • Tao, K.1    Mao, D.2    Hopwood, J.3
  • 9
    • 0003568792 scopus 로고
    • in edited by M. Francombe and J. Vossen (Academic, New York)
    • M. A. Lieberman and R. A. Gottscho, in Physics of Thin Films edited by, M. Francombe, and, J. Vossen, (Academic, New York, 1994), Vol. 18.
    • (1994) Physics of Thin Films , vol.18
    • Lieberman, M.A.1    Gottscho, R.A.2
  • 12
    • 34247540867 scopus 로고    scopus 로고
    • Oxygen discharges diluted with argon: Dissociation processes
    • DOI 10.1088/0963-0252/16/2/025, PII S0963025207368424, 025
    • J. T. Gudmundsson and E. G. Thorsteinsson, Plasma Sources Sci. Technol. PSTEEU 0963-0252 16, 399 (2007). 10.1088/0963-0252/16/2/025 (Pubitemid 46646763)
    • (2007) Plasma Sources Science and Technology , vol.16 , Issue.2 , pp. 399-412
    • Gudmundsson, J.T.1    Thorsteinsson, E.G.2
  • 15
    • 0035870956 scopus 로고    scopus 로고
    • JAPIAU 0021-8979, 10.1063/1.1354652
    • T. Kimura and K. Ohe, J. Appl. Phys. JAPIAU 0021-8979 89, 4240 (2001). 10.1063/1.1354652
    • (2001) J. Appl. Phys. , vol.89 , pp. 4240
    • Kimura, T.1    Ohe, K.2
  • 16
    • 34250930966 scopus 로고
    • ZEPYAA 0044-3328, in German. 10.1007/BF01773007
    • M. J. Druyvesteyn, Z. Phys. ZEPYAA 0044-3328 64, 781 (1930) in German. 10.1007/BF01773007
    • (1930) Z. Phys. , vol.64 , pp. 781
    • Druyvesteyn, M.J.1
  • 17
    • 0033341723 scopus 로고    scopus 로고
    • 4 discharges
    • DOI 10.1088/0963-0252/8/4/305
    • T. Kimura and K. Ohe, Plasma Sources Sci. Technol. PSTEEU 0963-0252 8, 553 (1999). 10.1088/0963-0252/8/4/305 (Pubitemid 30514839)
    • (1999) Plasma Sources Science and Technology , vol.8 , Issue.4 , pp. 553-560
    • Kimura, T.1    Ohe, K.2
  • 18
    • 0020707195 scopus 로고
    • JPAPBE 0022-3727, 10.1088/0022-3727/16/2/013
    • S. Ono and S. Teii, J. Phys. D JPAPBE 0022-3727 16, 163 (1983). 10.1088/0022-3727/16/2/013
    • (1983) J. Phys. D , vol.16 , pp. 163
    • Ono, S.1    Teii, S.2
  • 20
    • 33750600651 scopus 로고    scopus 로고
    • Gas temperature and surface heating in plasma enhanced chemical-vapour- deposition
    • DOI 10.1088/0963-0252/15/4/023, PII S0963025206193408, 023
    • S. Nunomura, M. Kondo, and H. Akatsuka, Plasma Sources Sci. Technol. PSTEEU 0963-0252 15, 783 (2006). 10.1088/0963-0252/15/4/023 (Pubitemid 44679424)
    • (2006) Plasma Sources Science and Technology , vol.15 , Issue.4 , pp. 783-789
    • Nunomura, S.1    Kondo, M.2    Akatsuka, H.3
  • 21
    • 0001523727 scopus 로고
    • JCPSA6 0021-9606, 10.1063/1.1679890
    • P. S. Ganas, J. Chem. Phys. JCPSA6 0021-9606 59, 5411 (1973). 10.1063/1.1679890
    • (1973) J. Chem. Phys. , vol.59 , pp. 5411
    • Ganas, P.S.1
  • 22
    • 33750580461 scopus 로고    scopus 로고
    • Basics of plasma spectroscopy
    • DOI 10.1088/0963-0252/15/4/S01, PII S0963025206124974, S01
    • U. Fantz, Plasma Sources Sci. Technol. PSTEEU 0963-0252 15, S137 (2006). 10.1088/0963-0252/15/4/S01 (Pubitemid 44679438)
    • (2006) Plasma Sources Science and Technology , vol.15 , Issue.4
    • Fantz, U.1
  • 23
    • 38849203147 scopus 로고    scopus 로고
    • Modeling of the electrode microwave discharge in nitrogen
    • DOI 10.1088/0963-0252/16/4/006, PII S0963025207521766
    • Y. A. Lebedev, A. V. Tatarinov, and I. L. Epstein, Plasma Sources Sci. Technol. PSTEEU 0963-0252 16, 726 (2007). 10.1088/0963-0252/16/4/006 (Pubitemid 351189326)
    • (2007) Plasma Sources Science and Technology , vol.16 , Issue.4 , pp. 726-733
    • Lebedev, Yu.A.1    Tatarinov, A.V.2    Epstein, I.L.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.