-
2
-
-
18644383746
-
2 in an inductively coupled plasma by vacuum ultraviolet emission spectroscopy
-
DOI 10.1063/1.1501741
-
T. Nakano, S. Kumagai, and S. Samukawa, J. Appl. Phys. JAPIAU 0021-8979 92, 2990 (2002). 10.1063/1.1501741 (Pubitemid 35209223)
-
(2002)
Journal of Applied Physics
, vol.92
, Issue.6
, pp. 2990
-
-
Nakano, T.1
Kumagai, S.2
Samukawa, S.3
-
3
-
-
0347300268
-
-
APPLAB 0003-6951, 10.1063/1.1630843
-
S. Agarwal, B. Hoex, M. C. M. van de Sanden, D. Maroudas, and E. S. Aydil, Appl. Phys. Lett. APPLAB 0003-6951 83, 4918 (2003). 10.1063/1.1630843
-
(2003)
Appl. Phys. Lett.
, vol.83
, pp. 4918
-
-
Agarwal, S.1
Hoex, B.2
Van De Sanden, M.C.M.3
Maroudas, D.4
Aydil, E.S.5
-
4
-
-
29144468977
-
Nitrogen dissociation in a low pressure cylindrical ICP discharge studied by actinometry and mass spectrometry
-
DOI 10.1088/0022-3727/38/24/003, PII S0022372705069688
-
T. Czerwiec, F. Greer, and D. B. Graves, J. Phys. D JPAPBE 0022-3727 38, 4278 (2005). 10.1088/0022-3727/38/24/003 (Pubitemid 41793963)
-
(2005)
Journal of Physics D: Applied Physics
, vol.38
, Issue.24
, pp. 4278-4289
-
-
Czerwiec, T.1
Greer, F.2
Graves, D.B.3
-
5
-
-
0036536193
-
Ionized physical vapor deposition of titanium nitride: A global plasma model
-
DOI 10.1063/1.1455139
-
K. Tao, D. Mao, and J. Hopwood, J. Appl. Phys. JAPIAU 0021-8979 91, 4040 (2002). 10.1063/1.1455139 (Pubitemid 34435533)
-
(2002)
Journal of Applied Physics
, vol.91
, Issue.7
, pp. 4040
-
-
Tao, K.1
Mao, D.2
Hopwood, J.3
-
6
-
-
33646720474
-
-
JAPIAU 0021-8979, 10.1063/1.2191567
-
K. Ishikawa, Y. Yamaoka, M. Nakamura, Y. Yamazaki, S. Yamasaki, Y. Ishikawa, and S. Samukawa, J. Appl. Phys. JAPIAU 0021-8979 99, 083305 (2006). 10.1063/1.2191567
-
(2006)
J. Appl. Phys.
, vol.99
, pp. 083305
-
-
Ishikawa, K.1
Yamaoka, Y.2
Nakamura, M.3
Yamazaki, Y.4
Yamasaki, S.5
Ishikawa, Y.6
Samukawa, S.7
-
7
-
-
0036571916
-
2-Ar discharge. I. Self-consistent theoretical model
-
DOI 10.1063/1.1462842
-
J. Henriques, E. Tatarova, V. Guerra, and C. M. Ferreira, J. Appl. Phys. JAPIAU 0021-8979 91, 5622 (2002). 10.1063/1.1462842 (Pubitemid 34562207)
-
(2002)
Journal of Applied Physics
, vol.91
, Issue.9
, pp. 5622
-
-
Henriques, J.1
Tatarova, E.2
Guerra, V.3
Ferreira, C.M.4
-
8
-
-
0036571953
-
2-Ar discharge. II. Experiment and comparison with theory
-
DOI 10.1063/1.1462843
-
J. Henriques, E. Tatarova, F. M. Dias, and C. M. Ferreira, J. Appl. Phys. JAPIAU 0021-8979 91, 5632 (2002). 10.1063/1.1462843 (Pubitemid 34562208)
-
(2002)
Journal of Applied Physics
, vol.91
, Issue.9
, pp. 5632
-
-
Henriques, J.1
Tatarova, E.2
Dias, F.M.3
Ferreira, C.M.4
-
9
-
-
0003568792
-
-
in edited by M. Francombe and J. Vossen (Academic, New York)
-
M. A. Lieberman and R. A. Gottscho, in Physics of Thin Films edited by, M. Francombe, and, J. Vossen, (Academic, New York, 1994), Vol. 18.
-
(1994)
Physics of Thin Films
, vol.18
-
-
Lieberman, M.A.1
Gottscho, R.A.2
-
10
-
-
0028448136
-
-
JESOAN 0013-4651, 10.1149/1.2054960
-
C. Lee, D. B. Graves, M. A. Lieberman, and D. W. Hess, J. Electrochem. Soc. JESOAN 0013-4651 141, 1546 (1994). 10.1149/1.2054960
-
(1994)
J. Electrochem. Soc.
, vol.141
, pp. 1546
-
-
Lee, C.1
Graves, D.B.2
Lieberman, M.A.3
Hess, D.W.4
-
12
-
-
34247540867
-
Oxygen discharges diluted with argon: Dissociation processes
-
DOI 10.1088/0963-0252/16/2/025, PII S0963025207368424, 025
-
J. T. Gudmundsson and E. G. Thorsteinsson, Plasma Sources Sci. Technol. PSTEEU 0963-0252 16, 399 (2007). 10.1088/0963-0252/16/2/025 (Pubitemid 46646763)
-
(2007)
Plasma Sources Science and Technology
, vol.16
, Issue.2
, pp. 399-412
-
-
Gudmundsson, J.T.1
Thorsteinsson, E.G.2
-
15
-
-
0035870956
-
-
JAPIAU 0021-8979, 10.1063/1.1354652
-
T. Kimura and K. Ohe, J. Appl. Phys. JAPIAU 0021-8979 89, 4240 (2001). 10.1063/1.1354652
-
(2001)
J. Appl. Phys.
, vol.89
, pp. 4240
-
-
Kimura, T.1
Ohe, K.2
-
16
-
-
34250930966
-
-
ZEPYAA 0044-3328, in German. 10.1007/BF01773007
-
M. J. Druyvesteyn, Z. Phys. ZEPYAA 0044-3328 64, 781 (1930) in German. 10.1007/BF01773007
-
(1930)
Z. Phys.
, vol.64
, pp. 781
-
-
Druyvesteyn, M.J.1
-
17
-
-
0033341723
-
4 discharges
-
DOI 10.1088/0963-0252/8/4/305
-
T. Kimura and K. Ohe, Plasma Sources Sci. Technol. PSTEEU 0963-0252 8, 553 (1999). 10.1088/0963-0252/8/4/305 (Pubitemid 30514839)
-
(1999)
Plasma Sources Science and Technology
, vol.8
, Issue.4
, pp. 553-560
-
-
Kimura, T.1
Ohe, K.2
-
18
-
-
0020707195
-
-
JPAPBE 0022-3727, 10.1088/0022-3727/16/2/013
-
S. Ono and S. Teii, J. Phys. D JPAPBE 0022-3727 16, 163 (1983). 10.1088/0022-3727/16/2/013
-
(1983)
J. Phys. D
, vol.16
, pp. 163
-
-
Ono, S.1
Teii, S.2
-
19
-
-
6344277093
-
-
JAPNDE 0021-4922, 10.1143/JJAP.43.5550
-
S. Koike, T. Sakamoto, H. Kobori, H. Matsuura, and H. Akatsuka, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 43, 5550 (2004). 10.1143/JJAP.43.5550
-
(2004)
Jpn. J. Appl. Phys., Part 1
, vol.43
, pp. 5550
-
-
Koike, S.1
Sakamoto, T.2
Kobori, H.3
Matsuura, H.4
Akatsuka, H.5
-
20
-
-
33750600651
-
Gas temperature and surface heating in plasma enhanced chemical-vapour- deposition
-
DOI 10.1088/0963-0252/15/4/023, PII S0963025206193408, 023
-
S. Nunomura, M. Kondo, and H. Akatsuka, Plasma Sources Sci. Technol. PSTEEU 0963-0252 15, 783 (2006). 10.1088/0963-0252/15/4/023 (Pubitemid 44679424)
-
(2006)
Plasma Sources Science and Technology
, vol.15
, Issue.4
, pp. 783-789
-
-
Nunomura, S.1
Kondo, M.2
Akatsuka, H.3
-
21
-
-
0001523727
-
-
JCPSA6 0021-9606, 10.1063/1.1679890
-
P. S. Ganas, J. Chem. Phys. JCPSA6 0021-9606 59, 5411 (1973). 10.1063/1.1679890
-
(1973)
J. Chem. Phys.
, vol.59
, pp. 5411
-
-
Ganas, P.S.1
-
22
-
-
33750580461
-
Basics of plasma spectroscopy
-
DOI 10.1088/0963-0252/15/4/S01, PII S0963025206124974, S01
-
U. Fantz, Plasma Sources Sci. Technol. PSTEEU 0963-0252 15, S137 (2006). 10.1088/0963-0252/15/4/S01 (Pubitemid 44679438)
-
(2006)
Plasma Sources Science and Technology
, vol.15
, Issue.4
-
-
Fantz, U.1
-
23
-
-
38849203147
-
Modeling of the electrode microwave discharge in nitrogen
-
DOI 10.1088/0963-0252/16/4/006, PII S0963025207521766
-
Y. A. Lebedev, A. V. Tatarinov, and I. L. Epstein, Plasma Sources Sci. Technol. PSTEEU 0963-0252 16, 726 (2007). 10.1088/0963-0252/16/4/006 (Pubitemid 351189326)
-
(2007)
Plasma Sources Science and Technology
, vol.16
, Issue.4
, pp. 726-733
-
-
Lebedev, Yu.A.1
Tatarinov, A.V.2
Epstein, I.L.3
-
24
-
-
33646345575
-
Properties of an atmospheric pressure radio-frequency argon and nitrogen plasma
-
DOI 10.1088/0963-0252/15/2/005, PII S0963025206052376
-
M. Moravej, X. Yang, M. Barankin, J. Penelon, S. E. Babayan, and R. F. Hicks, Plasma Sources Sci. Technol. PSTEEU 0963-0252 15, 204 (2006). 10.1088/0963-0252/15/2/005 (Pubitemid 43672629)
-
(2006)
Plasma Sources Science and Technology
, vol.15
, Issue.2
, pp. 204-210
-
-
Moravej, M.1
Yang, X.2
Barankin, M.3
Penelon, J.4
Babayan, S.E.5
Hicks, R.F.6
-
25
-
-
14644441660
-
2 microwave discharges
-
DOI 10.1088/0963-0252/14/1/003
-
E. Tatarova, F. M. Dias, B. Gordiets, and C. M. Ferreira, Plasma Sources Sci. Technol. PSTEEU 0963-0252 14, 19 (2005). 10.1088/0963-0252/14/1/003 (Pubitemid 40308307)
-
(2005)
Plasma Sources Science and Technology
, vol.14
, Issue.1
, pp. 19-31
-
-
Tatarova, E.1
Dias, F.M.2
Gordiets, B.3
Ferreira, C.M.4
-
26
-
-
0032072918
-
-
PSTEEU 0963-0252, 10.1088/0963-0252/7/2/016
-
F. Debal, J. Bretagne, M. Jumet, M. Wautelet, J. P. Dauchot, and M. Hecq, Plasma Sources Sci. Technol. PSTEEU 0963-0252 7, 219 (1998). 10.1088/0963-0252/7/2/016
-
(1998)
Plasma Sources Sci. Technol.
, vol.7
, pp. 219
-
-
Debal, F.1
Bretagne, J.2
Jumet, M.3
Wautelet, M.4
Dauchot, J.P.5
Hecq, M.6
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