Estimation of dissociation degree of N 2 in an inductively coupled plasma by vacuum ultraviolet emission spectroscopy

Journal of Applied Physics

Volumn 92, Issue 6, 2002, Pages 2990-2995

  Nakano, Toshiki ^a   Kumagai, Shinya ^b   Samukawa, Seiji ^b  

^a NATIONAL DEFENSE ACADEMY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CROSS SECTION; DISSOCIATION DEGREE; ELECTRON-IMPACT EXCITATION; EXCITATION RATE; HIGH DENSITY PLASMAS; INNER SURFACES; KINETIC MODELS; METASTABLES; NUMBER DENSITY; PLASMA REACTORS; POSITIVE EMISSIONS; PRESSURE DEPENDENCE; RF-POWER; VACUUM ULTRAVIOLET EMISSION; VACUUM ULTRAVIOLETS;

EMISSION SPECTROSCOPY; ESTIMATION; EXCITED STATES; IMPACT IONIZATION; INDUCTIVELY COUPLED PLASMA; PLASMA APPLICATIONS; VACUUM;

DISSOCIATION;

EID: 18644383746     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1501741     Document Type: Article

References (29)

1. M. Seelmann-Eggebert, H. Zimmermann, H. Obloh, R. Niebuhr, and B. Wachtendorf, J. Vac. Sci. Technol. A 16, 2008 (1998). jva JVTAD6 0734-2101
2. Z. Wang, D. M. Diatezua, D-G. Park, Z. Chen, H. Morkoc, and A. Rockett, J. Vac. Sci. Technol. B 17, 2034 (1999). jvb JVTBD9 0734-211X
3. H. Niimi and G. Lucovsky, J. Vac. Sci. Technol. B 17, 2610 (1999). jvb JVTBD9 0734-211X
4. K. Watanabe, T. Tatsumi, M. Togo, and T. Mogami, J. Appl. Phys. 90, 4701 (2001). jap JAPIAU 0021-8979
5. R. J. Molnar, T. Lei, and T. D. Moustakas, Appl. Phys. Lett. 62, 72 (1993). apl APPLAB 0003-6951
6. S. H. Cho, H. Sakamoto, K. Akimoto, Y. Okada, and M. Kawabe, Jpn. J. Appl. Phys., Part 2 34, L236 (1995). jjc JAPLD8 0021-4922
7. Y. Wang, R. J. Van Brunt, and J. K. Olthoff, J. Appl. Phys. 83, 703 (1998). jap JAPIAU 0021-8979
8. G. Cernogora, L. Hochard, M. Touzeau, and C. M. Ferreia, J. Phys. B 14, 2977 (1981). jbm JPAMA4 0022-3700
9. S. Tada, S. Takashima, M. Ito, M. Hori, T. Goto, and Y. Sakamoto, J. Appl. Phys. 88, 1756 (2000). jap JAPIAU 0021-8979
10. T. Nakano and S. Samukawa, J. Vac. Sci. Technol. A 16, 2065 (1998). jva JVTAD6 0734-2101
11. M. Malyshev and V. M. Donnely, J. Vac. Sci. Technol. A 15, 550 (1997). jva JVTAD6 0734-2101
12. E. J. Stone and E. C. Zipf, J. Chem. Phys. 58, 4278 (1973). jcp JCPSA6 0021-9606
13. J. T. Fons, R. S. Schappe, and C. C. Lin, Phys. Rev. A 53, 2239 (1996). pra PLRAAN 1050-2947
14. J. M. Ajello, G. K. James, B. O. Franklin, and D. E. Shemansky, Phys. Rev. A 40, 3524 (1989). pra PLRAAN 1050-2947
15. M. Malyshev and V. M. Donnely, J. Appl. Phys. 87, 1642 (2000). jap JAPIAU 0021-8979
16. NIST Atomic spectra database, http://physics.nist.gov/cgi-bin/AtData/ main-asd.
17. P. C. Cosby, J. Chem. Phys. 98, 9544 (1993). jcp JCPSA6 0021-9606
18. M. Malyshev, V. M. Donnely, and S. Samukawa, J. Appl. Phys. 84, 1222 (1998). jap JAPIAU 0021-8979
19. S. Samukawa and H. Akashi, IEEE Trans. Plasma Sci. 26, 1621 (1998). tps ITPSBD 0093-3813
20. T. Kimura and K. Ohe, Jpn. J. Appl. Phys., Part 1 39, 282 (2000). jjb JAPNDE 0021-4922
21. T. Nakano and S. Samukawa, J. Vac. Sci. Technol. B 18, 2774 (2000). jvb JVTBD9 0734-211X
22. P. B. Armentrout, S. M. Tarr, A. Dori, and R. S. Freund, J. Chem. Phys. 75, 2786 (1981). jcp JCPSA6 0021-9606
23. D. C. Cartwright, S. Trajmar, A. Chutjian, and W. Williams, Phys. Rev. A 16, 1041 (1977). pra PLRAAN 1050-2947
24. B. Kramers, Th. Glenewinkel-Meyer, and J. Meichsner, J. Appl. Phys. 89, 3115 (2001). jap JAPIAU 0021-8979
25. G. Cernogora, C. M. Ferreira, L. Hochard, M. Touzeau, and J. Loureiro, J. Phys. B 17, 4429 (1984). jbm JPAMA4 0022-3700
26. V. M. Donnelly and M. V. Malyshev, Appl. Phys. Lett. 77, 2467 (2000). apl APPLAB 0003-6951
27. M. J. Schabel, V. M. Donnelly, A. Kornblit, and W. W. Tai, J. Vac. Sci. Technol. A 20, 555 (2002). jva JVTAD6 0734-2101
28. Brett A. Cruden, M. V. V. S. Rao, Surendra P. Sharma, and M. Meyyappan, J. Appl. Phys. 91, 8955 (2002). jap JAPIAU 0021-8979
29. L. Lefevre, T. Belmonte, and H. Michel, J. Appl. Phys. 87, 7497 (2000). jap JAPIAU 0021-8979