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Volumn 7, Issue 7-8, 2010, Pages 2262-2264

Modelling of cubic AlxGa1-xN/GaN resonant tunnel diode structures

Author keywords

AlGaN GaN; Electrical properties; Modeling; Tunneling diode

Indexed keywords

ALGAN/GAN; BAND OFFSETS; BARRIER COMPOSITIONS; BARRIER THICKNESS; CURRENT MAGNITUDES; DIODE STRUCTURE; DOUBLE BARRIERS; ELECTRICAL PROPERTY; FIGURE OF MERIT; MODELING; OPTIMUM PARAMETERS; RESONANT PEAKS; RESONANT TUNNELLING DIODE; TUNNELING DIODES; WELL WIDTH;

EID: 77955791546     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200983543     Document Type: Conference Paper
Times cited : (7)

References (19)
  • 12
    • 0035868136 scopus 로고    scopus 로고
    • c-AlN is an indirect gap semiconductor with an X-valley gap of about 5 eV
    • c-AlN is an indirect gap semiconductor with an X-valley gap of about 5 eV [Thompson et al., J. Appl. Phys. 89, 3331 (2001)].
    • (2001) J. Appl. Phys. , vol.89 , pp. 3331
    • Thompson1
  • 13
    • 0001312190 scopus 로고
    • However, it has been shown that the direct gap is important for resonant tunnelling, while non-resonant tunnelling via the indirect gap gives a background
    • However, it has been shown that the direct gap is important for resonant tunnelling, while non-resonant tunnelling via the indirect gap gives a background [Mendez et al., Phys. Rev. B 34, 6026 (1986)]
    • (1986) Phys. Rev. B , vol.34 , pp. 6026
    • Mendez1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.