Formation of PTFE-like films in CF4 microwave plasmas

Thin Solid Films

Volumn 518, Issue 17, 2010, Pages 4835-4839

  Quade, Antje ^a   Polak, Martin ^a   Schröder, Karsten ^a   Ohl, Andreas ^a   Weltmann, Klaus Dieter ^a  

^a LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

Author keywords

Carbon tetrafluoride; Fluoropolymers; Microwave discharges; Plasma enhanced chemical vapor deposition; X ray photoelectron spectroscopy

Indexed keywords

CARBON TETRAFLUORIDE; DEPOSITION OF FILMS; ETCHING GAS; FLUORO-POLYMERS; GAS DISCHARGE; HYDROPHOBIC SURFACES; LOW PRESSURE PLASMA; LOW PRESSURES; MICROWAVE DISCHARGES; MICROWAVE PLASMA; PRECURSOR MOLECULES; THIN FILM FORMATION; WATER CONTACT ANGLE;

CONTACT ANGLE; ETCHING; HYDROPHOBICITY; MICROWAVES; PHOTOELECTRICITY; PHOTONS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POLYMER BLENDS; POLYSTYRENES; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRIC DISCHARGES;

EID: 77955664054     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.02.005     Document Type: Article

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