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Volumn 518, Issue 19, 2010, Pages 5409-5415

Influence of the plasma expansion dynamics on the structural properties of pulsed laser ablation deposited tin oxide thin films

Author keywords

Plasma expansion; Pulsed laser ablation; Tin oxide

Indexed keywords

DEPOSITED FILMS; FAST PHOTOGRAPHY; FOURIER TRANSFORM INFRARED ABSORPTION SPECTROSCOPY; FREE EXPANSIONS; IN-VACUUM; LASER GENERATED PLASMAS; OXYGEN GAS; OXYGEN PARTIAL PRESSURE; OXYGEN PRESSURE; PLASMA EXPANSION; PULSED LASER ABLATION; STOICHIOMETRIC FILMS; STRUCTURAL AND MORPHOLOGICAL PROPERTIES; SUBSTRATE TEMPERATURE; SUBSTRATES TEMPERATURE; TIME-RESOLVED; TIN OXIDE THIN FILM; X-RAY PHOTOELECTRONS;

EID: 77955663844     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.03.067     Document Type: Article
Times cited : (15)

References (36)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.