Morphological, chemical and electrical characterization of Pt-SnO2 thin film grown on rough and mechanically polished Al2O3 substrates

Journal of Physics D: Applied Physics

Volumn 29, Issue 9, 1996, Pages 2235-2239

  Cricenti, A ^a   Generosi, R ^a   Scarselli, M A ^a   Perfetti, P ^a   Siciliano, P ^b   Serra, A ^b   Tepore, A ^c   Coluzza, C ^d   Almeida, J ^d   Margaritondo, G ^e  

^a CNR   (Italy)

^b Istituto per lo Studio di Nuovi   (Italy)

^c UNIVERSITY OF SALENTO   (Italy)

^d SAPIENZA UNIVERSITY OF ROME   (Italy)

^e EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; COMPOSITION; ELECTRIC CHARGE; FILM GROWTH; MORPHOLOGY; SEMICONDUCTING TIN COMPOUNDS; SEMICONDUCTOR GROWTH; SPUTTER DEPOSITION; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS;

RADIOFREQUENCY REACTIVE SPUTTERING; X RAY PHOTOEMISSION SPECTROMICROSCOPY;

SEMICONDUCTING FILMS;

EID: 0030244614     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/29/9/003     Document Type: Article

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