Influence of ambient gas on the growth and properties of porous tin-doped indium oxide thin films made by pulsed laser deposition

Thin Solid Films

Volumn 515, Issue 20-21, 2007, Pages 7813-7819

  Savu, R ^a   Joanni, E ^a,b  

^a UNIVERSITY OF PORTO   (Portugal)

^b UNIVERSITY OF TRÁS OS MONTES AND ALTO DOURO   (Portugal)

Author keywords

ITO; Laser ablation; Porosity; Resistance; Thin films

Indexed keywords

DOPING (ADDITIVES); ELECTRIC RESISTANCE; INDIUM COMPOUNDS; LASER ABLATION; NANOCRYSTALLINE MATERIALS; POROSITY; POROUS MATERIALS; PULSED LASER DEPOSITION; TIN;

INDIUM OXIDES;

THIN FILMS;

EID: 34547681298     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.04.014     Document Type: Article

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