Low temperature growth of smooth indium tin oxide films by ultraviolet assisted pulsed laser deposition

Journal of Optoelectronics and Advanced Materials

Volumn 4, Issue 1, 2002, Pages 21-25

  Craciun, V ^a   Chiritescu, C ^b   Kelly, F ^a   Singh, R K ^a  

^a University of Florida   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Indium tin oxide; Laser ablation; Roughness; Transparent and conductive oxides; Ultraviolet irradiation

Indexed keywords

ATOMIC FORCE MICROSCOPY; INDIUM COMPOUNDS; IRRADIATION; LASER ABLATION; MORPHOLOGY; PULSED LASER DEPOSITION; PULSED LASERS; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; TEMPERATURE; TIN OXIDES; ULTRAVIOLET LASERS;

CONDUCTIVE OXIDES; INDIUM TIN OXIDE; INDIUM TIN OXIDE FILMS; LOW TEMPERATURE GROWTH; MACROSCOPIC SCALE; ULTRAVIOLET IRRADIATIONS; ULTRAVIOLET-ASSISTED; X-RAY REFLECTIVITY TECHNIQUES;

OXIDE FILMS;

EID: 0002261550     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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