XPS study of the surface chemistry of L-CVD SnO2 thin films after oxidation

Thin Solid Films

Volumn 490, Issue 1, 2005, Pages 36-42

  Kwoka, M ^a   Ottaviano, L ^b   Passacantando, M ^b   Santucci, S ^b   Czempik, G ^a   Szuber, J ^a  

^a SILESIAN UNIVERSITY OF TECHNOLOGY   (Poland)

^b UNIVERSITY OF L'AQUILA   (Italy)

Author keywords

Deposition; Oxidation; Thin films; Tin dioxide

Indexed keywords

AGING OF MATERIALS; CHEMICAL VAPOR DEPOSITION; OXIDATION; STOICHIOMETRY; SURFACE CHEMISTRY; TIN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

AGEING EFFECT; AMBIENT OXIDATION; OXIDATION STATES; TIN DIOXIDE;

THIN FILMS;

EID: 24044493585     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.04.014     Document Type: Conference Paper

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