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Volumn 518, Issue 17, 2010, Pages 4791-4797
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Thin film deposition and characterization of pure and iron-doped electron-beam evaporated tungsten oxide for gas sensors
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Author keywords
Atomic force microscopy; Co evaporated thin films; Electron beam evaporation; Optical properties; Surface characterization; Surface morphology; Tungsten oxide; X ray photoelectron spectroscopy
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Indexed keywords
AFM;
ALUMINA SUBSTRATES;
ANNEALED FILMS;
BAND GAP ENERGY;
CO-EVAPORATED;
CRYSTALLINITIES;
ELECTRON BEAM EVAPORATION;
FE FILMS;
GAS SELECTIVITY;
GAS SENSING APPLICATIONS;
GAS SENSITIVITY;
GAS SENSORS;
HIGH VACUUM;
IRON-DOPED;
NANOSTRUCTURED THIN FILM;
NOISE SPECTROSCOPY;
OPTICAL BAND GAP ENERGY;
PURE TUNGSTEN;
ROOM TEMPERATURE;
SURFACE CHARACTERIZATION;
THIN-FILM DEPOSITIONS;
TUNGSTEN OXIDE;
TUNGSTEN OXIDE FILMS;
AMORPHOUS FILMS;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
ATOMS;
COBALT;
DEPOSITION;
DOPING (ADDITIVES);
ELECTRON BEAMS;
ELECTRON OPTICS;
ELECTRONS;
ENERGY GAP;
EVAPORATION;
GAS DETECTORS;
GAS SENSING ELECTRODES;
METALLIC FILMS;
MORPHOLOGY;
OPTICAL PROPERTIES;
OXIDES;
PHOTOELECTRICITY;
PHOTONS;
RAMAN SPECTROSCOPY;
SENSORS;
STOICHIOMETRY;
SURFACE MORPHOLOGY;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
THIN FILMS;
TUNGSTEN;
TUNGSTEN COMPOUNDS;
VAPOR DEPOSITION;
X RAY PHOTOELECTRON SPECTROSCOPY;
X RAYS;
OXIDE FILMS;
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EID: 77955661466
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2010.01.037 Document Type: Article |
Times cited : (41)
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References (32)
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