Properties of metal doped tungsten oxide thin films for NOx gas sensors grown by PLD method combined with sputtering process

Sensors and Actuators, B: Chemical

Volumn 100, Issue 1-2, 2004, Pages 266-269

  Kawasaki, Hiroharu ^a   Ueda, Tsuyoshi ^a   Suda, Yoshiaki ^a   Ohshima, Tamiko ^a  

^a SASEBO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Metal doped; Plasma; Pulsed laser deposition; Sensor; Tungsten oxide

Indexed keywords

CHEMICAL SENSORS; ELECTROCHEMICAL SENSORS; POLYCRYSTALLINE MATERIALS; PRECIOUS METALS; PULSED LASER DEPOSITION; PYROLYSIS; SENSITIVITY ANALYSIS; SOL-GELS; SPUTTERING; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL SENSITIZATION; POLYMER SENSOR; TUNGSTEN TRIOXIDE;

THIN FILMS;

EID: 2342479792     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2003.12.052     Document Type: Article

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