Sensitivity and selectivity improvement of rf sputtered WO3 microhotplate gas sensors

Sensors and Actuators, B: Chemical

Volumn 113, Issue 1, 2006, Pages 241-248

  Stankova, M ^a   Vilanova, X ^a   Calderer, J ^b   Llobet, E ^a   Brezmes, J ^a   Gracia I ^c   Cane C ^c   Correig, X ^a  

^a UNIVERSITAT ROVIRA I VIRGILI   (Spain)

^b UNIVERSITAT POLITÈCNICA DE CATALUNYA   (Spain)

^c INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

Author keywords

Metal and metal oxide additives; Metal oxide sensors; Selectivity; Sensitivity; Tungsten oxide

Indexed keywords

CARBON MONOXIDE; CATALYST SELECTIVITY; GAS DETECTORS; SEMICONDUCTOR DOPING; SENSITIVITY ANALYSIS; SPUTTER DEPOSITION; TUNGSTEN COMPOUNDS;

METAL AND METAL OXIDE ADDITIVES; METAL OXIDE SENSORS; TUNGSTEN OXIDE;

CHEMICAL SENSORS;

EID: 29244431618     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2005.02.056     Document Type: Article

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